Reflective plate of LCD and fabrication method thereof
View Patent ↗A reflective plate used in a liquid crystal display including a substrate, a first peak and depression layer of organic insulator on the substrate, a second peak and depression layer of organic insulator overlapping with the first peak and depression layer, and a reflective layer on the first and second peak and depression layers.
1. A method for fabricating a reflective plate used in a liquid crystal display comprising:
depositing a first organic insulating layer on a substrate;
forming a plurality of first peak patterns having a predetermined distance from the first organic insulating layer by using a first mask;
depositing a second organic insulating layer on the substrate including the first peak patterns;
forming a plurality of second peak patterns between the first peak patterns from the second organic insulating layer by using a second mask; and
forming a reflective electrode on the first and second peak patterns;
wherein the second peak patterns have a different height from the first peak patterns, and overlap only a portion of the adjacent first peak pattern.
2. The method according to claim 1 , wherein the first and second peak patterns are softened by a curing bake process to form a plurality of peak patterns.
3. The method according to claim 1 , wherein each of the first peak patterns comprises a plurality of first peaks and each of the second peak pattern comprises a plurality of second peaks, wherein a highest point of each of the first peaks is located at different locations from a highest point of each of the second peaks.
4. The method according to claim 1 , wherein each of the first peak patterns comprises a plurality of first peaks and each of the second peak pattern comprises a plurality of second peaks, wherein a center of each of the first peaks is located at different locations from a center of each of the second peaks.
5. The method according to claim 1 , wherein the first and second organic insulating layers are photosensitive resin.
6. The method according to claim 1 , wherein the first mask comprises a light transmission portion and a light reflecting portion.
7. The method according to claim 1 , wherein the second mask comprises a light transmission portion and a light reflecting portion.
8. The method according to claim 1 , wherein the first mask is one of a transflective mask and a diffraction mask.
9. The method according to claim 1 , wherein the second mask is one of a transflective mask and a diffraction mask.
10. The method according to claim 1 , wherein the first and second peak patterns have a plurality of peaks that are randomly arranged.
11. The method according to claim 1 , wherein each of the first peak patterns comprises a plurality of first peaks and each of the second peak pattern comprises a plurality of second peak overlapped with the first peaks.
12. The method according to claim 1 , wherein each of the first peak patterns comprises a plurality of first peaks and each of the second peak pattern comprises a plurality of second peaks overlapped with portions of the first peaks with a height less than one half height of the first peaks.
13. The method according to claim 1 , wherein a reflecting surface formed by the first and second peak patterns has final peak shapes in which a ratio of a height to a radius of the peak is 1:10.
14. The method according to claim 1 , wherein the second peak patterns between the first peak patterns directly contacts the substrate.