Electric device having nanoscale wires and gaps
View Patent ↗A method for forming first and second linear structures of a first composition that meet at right angles, there being a gap at the point at which the structures meet. The linear structures are constructed on an etchable crystalline layer having the first composition. First and second self-aligned nanowires of a second composition are grown on this layer and used as masks for etching the layer. The self-aligned nanowires are constructed from a material that has an asymmetric lattice mismatch with respect to the crystalline layer. The gap is sufficiently small to allow one of the structures to act as the gate of a transistor and the other to form the source and drain of the transistor. The gap can be filled with electrically switchable materials thereby converting the transistor to a memory cell.
1. An electric device comprising: a first elongated nanowire on and touching an insulating surface and a second elongated nanowire on and touching the same side of said insulating surface, said first nanowire having a first straight portion and said second nanowire having a second straight portion, said first straight portion and said second straight portion forming a T-shaped structure, said first and second straight portions separated by a gap of between 0.4 nm and 10 nm.
2. The electric device of claim 1 wherein said first and second nanowires form a transistor having a source, drain, and gate, and wherein said first nanowire has first and second ends; said first end of said first nanowire forming said source, said second end of said first nanowire forming said drain, and said second nanowire forming said gate.
3. The electric device of claim 1 wherein said first elongated nanowire comprises a semiconductor chosen from the group consisting of Si, Ge, Ge x Si 1-x where 0<x<1, GaAs, InAs, AlGaAs, InGaAs, GaN, InN, AlN, AlGaN, and InGaN.
4. The electric device of claim 1 wherein said gap is filled with a material that stores electrical charge.
5. The electric device of claim 1 wherein said gap is filled with a material having electric dipole moment.
6. The electric device of claim 1 wherein said first and second nanowires form a two-electrode memory switching device, said first nanowire forming the first electrode of said switching device and said second nanowire forming the second electrode of said switching device.
7. An electric device comprising: a first linear nanowire on an insulating surface and a second linear nanowire on said insulating surface at a right angle to and in the same plane as said first nanowire, said first nanowire and said second nanowire forming a T-shaped structure, said first and second nanowire separated by a gap of between 0.4 nm and 10 nm.
8. The electric device of claim 7 wherein said first and second nanowires form a transistor having a source, drain, and gate, and wherein said first nanowire has first and second ends; said first end of said first nanowire forming said source, said second end of said first nanowire forming said drain, and said second nanowire forming said gate.
9. The electric device of claim 7 wherein said first elongated nanowire comprises a semiconductor chosen from the group consisting of Si, Ge, Ge x Si 1-x where 0<x<1, GaAs, InAs, AlGaAs, InGaAs, GaN, InN, AlN, AlGaN, and InGaN.
10. The electric device of claim 7 wherein said gap is filled with a material that stores electrical charge.
11. The electric device of claim 7 wherein said gap is filled with a material having electric dipole moment.
12. The electric device of claim 7 wherein said first and second nanowires form a two-electrode memory switching device, said first nanowire forming the first electrode of said switching device and said second nanowire forming the second electrode of said switching device.