Method of manufacturing a substrate for an lcd device
View Patent ↗The present invention is a method of manufacturing a liquid crystal display device, wherein light having an exposure energy is irradiated on the surface of a photo-sensitive resin layer having a predetermined film thickness, and a distribution of thermal deformation characteristics in the thickness direction (or the plane direction) of the photo-sensitive resin layer is formed, then heat treatment is performed to form random undulation (micro-grooves or micro-wrinkles) on the surface of the photo-sensitive resin layer.
1. A method of manufacturing a substrate for a liquid-crystal display device comprising the steps of:
forming a resin layer on a substrate;
selectively reforming the surface portion of said resin layer by applying energy with an energy density per unit time of a prescribed value or more to said resin layer to generate a difference in a rate of thermal shrinkage between said surface portion and the layer portion other than the surface portion in said resin layer;
performing a heat treatment to said resin layer to form random wrinkles of micro-grooves in said surface portion, said random wrinkles of micro-grooves having ridges of a linear or curved continuous pattern; and
forming reflective electrodes on said surface portion.
2. The method of manufacturing a substrate for a liquid-crystal display device according to claim 1 ,
wherein said energy is applied by irradiation with light.
3. The method of manufacturing a substrate for a liquid-crystal display device according to claim 2 ,
wherein said energy is applied by irradiation with ultraviolet rays.
4. The method of manufacturing a substrate for a liquid-crystal display device according to claim 3 ,
wherein said energy is applied by irradiation with said ultraviolet rays with an illuminance exceeding 12 mW/cm 2 .
5. The method of manufacturing a substrate for a liquid-crystal display device according to claim 3 ,
wherein said energy is applied by irradiation with said ultraviolet rays with an illuminance of no more than 12 mW/cm 2 and said resin layer is in a semi-hardened condition prior to the application of said energy.
6. The method of manufacturing a substrate for a liquid-crystal display device according to claim 5 ,
wherein heat treatment of said resin layer is performed at a prescribed temperature prior to the application of said energy.
7. The method of manufacturing a substrate for a liquid-crystal display device according to any of claims 1 to 6 ,
wherein photosensitive resin is employed for said resin layer.
8. The method of manufacturing a substrate for a liquid-crystal display device according to claim 7 ,
wherein novolac resist is employed for said resin layer.
9. A method of manufacturing a liquid-crystal display device in which a pair of substrates are manufactured and said substrates are mutually stuck together so that liquid-crystal is sealed between said substrates, wherein
one of said substrates is manufactured using a method of manufacturing a substrate for a liquid-crystal display device according to any of claims 1 to 6 .
10. A method of manufacturing a substrate for a liquid-crystal display device comprising the steps of:
forming a resin layer on a substrate;
selectively reforming the surface portion of said resin layer by applying energy with an energy density per unit time of a prescribed value or more to said resin layer without using a mask to generate a difference in a rate of thermal shrinkage between said surface portion and the layer portion other than the surface portion in said resin layer;
performing a heat treatment to said resin layer to form random wrinkles of micro-grooves in said surface portion; and
forming reflective electrodes on said surface portion.
11. The method of manufacturing a substrate for a liquid-crystal display device according to claim 10 ,
wherein said energy is applied by irradiation with light.
12. The method of manufacturing a substrate for a liquid-crystal display device according to claim 10 ,
wherein said energy is applied by irradiation with ultraviolet rays.
13. The method of manufacturing a substrate for a liquid-crystal display device according to claim 12 ,
wherein said energy is applied by irradiation with said ultraviolet rays with an illuminance exceeding 12 mW/cm 2 .
14. The method of manufacturing a substrate for a liquid-crystal display device according to claim 12 ,
wherein said energy is applied by irradiation with said ultraviolet rays with an illuminance of no more than 12 mW/cm 2 and said resin layer is in a semi-hardened condition prior to the application of said energy; and
further wherein heat treatment of said resin layer is performed at a prescribed temperature prior to the application of said energy.