Structure for loading substrate in substrate bonding apparatus for fabricating liquid crystal display device

1. A method of holding a substrate within a substrate bonding apparatus, comprising:

providing an upper stage having a contact surface and at least one passage intersecting the contact surface;

providing a suction force applying means within each passage for transmitting a suction force a predetermined distance from the contact surface;

arranging a substrate proximate the stage;

generating the suction force;

transmitting the generated suction force from the suction force applying means to operably proximate portions of the substrate; and

holding the substrate substantially parallel to the contact surface.

2. The method of claim 1 , further comprising providing a plurality of vacuum holes within the upper stage transmitting the generated suction force from the contact surface.

3. The method of claim 2 , further comprising transmitting the generated suction force from the plurality of vacuum holes to operably proximate portions of the substrate.

4. The method of claim 1 , wherein transmitting the generated suction force from the suction force applying means comprises moving the suction force applying means with respect to the contact surface such that the suction force applying means is operably proximate the at least one portion of the substrate.

5. The method of claim 4 , wherein moving the suction force applying means comprises projecting an end portion of the suction force applying means from within a respective passage to the predetermined distance from the contact surface.

6. The method of claim 5 , wherein the projecting comprises arranging an end portion of the suction force applying means operably proximate a portion of the substrate.

7. The method of claim 1 , wherein holding the substrate substantially parallel to the contact surface comprises moving the suction force applying means with respect to the contact surface.

8. The method of claim 7 , wherein the moving comprises arranging an end portion of the suction force applying means within a respective passage such that the end portion is substantially flush with the contact surface.

9. The method of claim 1 , wherein the step of providing a suction force applying means within each passage for transmitting a suction force a predetermined distance from the contact surface comprises:

providing a first suction force applying means within a first passage for transmitting a suction force a first predetermined distance from the contact surface; and

providing a second suction force applying means within a second passage for independently transmitting a suction force a second predetermined distance from the contact surface, wherein the first predetermined distance differs from the second predetermined distance.

10. A method of holding a substrate to a stage within a substrate bonding apparatus, comprising:

generating a suction force;

transmitting the generated suction force to an application point on a contact surface of an upper stage; and

transmitting the generated suction force to an application point at a predetermined distance away from the contact surface of the upper stage.

11. The method of claim 10 , further comprising applying the generated suction force transmitted to an application point at the contact surface of the upper stage to at least one portion of a substrate.

12. The method of claim 10 , further comprising applying the generated suction force transmitted to an application point at the predetermined distance away from the contact surface of the upper stage to at least one portion of a substrate.

13. The method of claim 12 , further comprising transmitting the generated suction force applied to the at least one portion of the substrate from the contact surface of the stage.

14. The method of claim 10 , wherein the step of transmitting the generated suction force to an application point at a predetermined distance away from the contact surface of the upper stage comprises:

transmitting a first generated suction force to an application point at a first predetermined distance away from the contact surface of the upper stage; and

transmitting a second generated suction force to an application point at second predetermined distance away from the contact surface of the upper stage.

15. The method of claim 14 , wherein the first predetermined distance differs from the second predetermined distance.

16. The method of claim 14 , wherein the first and second generated suction forces are independently transmitted.

17. A method of holding a substrate to a stage within a substrate bonding apparatus, comprising:

providing an upper stage having a contact surface and at least one passage intersecting the contact surface;

providing a first suction applicator within a first passage for transmitting a suction force from the contact surface a predetermined distance from the contact surface;

arranging a substrate proximate to the upper stage, wherein portions of the substrate sag; and

transmitting the first suction applicator to a sagging portion of the substrate.

18. The method of claim 17 , further comprising:

generating a suction; and

transmitting the suction to the first suction applicator.

19. The method of claim 17 , further comprising:

providing a second suction applicator within a second passage for transmitting a suction force from the contact surface a predetermined distance from the contact surface;

independently transmitting the second suction applicator to a second sagging portion of the substrate.

20. The method of claim 17 , further comprising:

holding the substrate substantially parallel to the contact surface of the upper stage.

21. The method of claim 17 , wherein the first suction applicator includes at least one pad.