Liquid crystal display device having patterned spacers and method of fabricating the same
View Patent ↗A color filter substrate for a liquid crystal display device includes a substrate, a black matrix having a plurality of open portions on the substrate, a color filter layer on the black matrix, and a dielectric layer including first and second layers on the color filter layer, wherein the first layer has a uniform thickness and the second layer has a convex pattern, and the first and second layers include the same material.
1. A method of fabricating a color filter substrate for a liquid crystal display device, comprising:
forming a black matrix having a plurality of open portions on a substrate;
forming a color filter layer on the black matrix;
forming an overcoat layer on the color filter layer;
forming a positive-type photoresist layer on the overcoat layer;
forming a photoresist pattern corresponding to the black matrix using photolithographic processes of the photoresist layer; and
etching the photoresist pattern and the overcoat layer to form a dielectric layer.
2. The method according to claim 1 , wherein the photoresist and the overcoat layer are etched using a dry etching method.
3. The method according to claim 1 , wherein the overcoat layer includes an acrylic material.
4. The method according to claim 1 , wherein the dielectric layer includes a first layer having a uniform thickness and a second layer having a convex pattern corresponding to the black matrix.
5. The method according to claim 4 , wherein the first layer planarizes the color filter layer and the second layer maintains a cell gap of the liquid crystal display device.
6. The method according to claim 1 , wherein forming the photoresist pattern comprises:
disposing a photo mask having a transmissive portion and a shielding portion over the photoresist layer, the transmissive portion and the shielding portion corresponding to the plurality of open portions and the black matrix;
exposing the photoresist layer using the photo mask; and
developing the photoresist layer.
7. The method according to claim 1 , wherein the photoresist pattern and the overcoat layer have substantially the same etching rate.
8. The method according to claim 7 , wherein a thickness of the photoresist pattern is substantially the same as a thickness of the second layer of the dielectric layer.
9. The method according to claim 1 , wherein the photoresist pattern is transcribed onto the overcoat layer.
10. A method of fabricating a liquid crystal display device, comprising:
forming a thin film transistor, a common electrode, and a pixel electrode on a first substrate having a plurality of sub-pixel regions;
forming a black matrix having a plurality of open portions corresponding to the sub-pixel region on a second substrate;
forming a color filter layer on the black matrix;
forming an overcoat layer on the color filter layer;
forming a photoresist layer on the overcoat layer;
forming a photoresist pattern corresponding to the black matrix using the photoresist layer;
etching the photoresist pattern and the overcoat layer to form a dielectric layer;
attaching the first and second substrates; and
forming a liquid crystal layer between the first and second substrates.
11. The method according to claim 10 , wherein the dielectric layer includes a first layer having a uniform thickness and a second layer having a convex pattern corresponding to the black matrix.
12. The method according to claim 11 , wherein the first layer planarizes the color filter layer and the second layer maintains a cell gap of the liquid crystal display device.
13. The method according to claim 12 , wherein a thickness of the second layer is substantially the same as a thickness of the liquid crystal layer.