IP Library Granted Patent US 6,902,944
Granted Patent B2
US 6,902,944 · App. 10/708,067 · Granted Jun 7, 2005

Method of manufacturing a semiconductor device and a method for fixing the semiconductor device using substrate jig

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Quick Facts
Patent No.
US 6,902,944
App. No.
10/708,067
Granted
Jun 7, 2005
Kind
B2
Abstract

The present invention relates to a method of manufacturing a semiconductor substrate including the back grind step, the dicing step, the pick up step, and the die bonding step of the wafer; and to a semiconductor substrate jig used in such method. The object of the present invention is to mitigate the effect and to prevent damage caused by the lack of strength in thinned semiconductor substrates. A jig with an outer frame 21 , and a rubber film 22 arranged within the outer frame 21 and having increasing and decreasing body size while deforming its shape by supplying air therein are provided. As the volume of the rubber film 22 increases, the wafer-fixing jig 20 deforms the rubber film and allows the tapes 2 and 6 arranged between the wafer 1 and the rubber film 22 A to be pushed toward the wafer 1 gradually from the center outward. The attachment step, the back grind step, the tape reapplication step, the pick up step and the die bonding step are conducted using such wafer-fixing jig.

Claims (10)

1. A semiconductor substrate jig used in arranging a film to a semiconductor substrate, wherein said semiconductor substrate jig comprises:

a frame;

a set table arranged within said frame;

a porous plate arranged within said frame on said set table;

a floor within said frame spaced from said set table on a side opposite said porous plate;

a rubber film enclosing said set table and porous plate; and

an air joint formed in said frame, passing through said floor and said set table, and provided for applying pressure to said porous plate within said rubber film.

2. The semiconductor substrate jig as defined in claim 1 , including a further vacuum hole passing through said floor and contacting an outside surface of said film.

3. The semiconductor substrate jig as defined in claim 1 , including guide shafts passing through said floor and through a wall of said film, movably journaled therewith and arranged to elevate said set table relative to said floor.

4. A semiconductor substrate jig as defined in claim 1 , including guide shafts passing through said floor and through a wall of said rubber film, movably journaled therewith and arranged to elevate said set table relative to said floor.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2015
From: FUJITSU SEMICONDUCTOR LIMITED
To: SOCIONEXT INC.
Reel/Frame 035507/0923 →
CHANGE OF NAME Recorded Aug 2, 2010
From: FUJITSU MICROELECTRONICS LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 024804/0269 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 5, 2008
From: FUJITSU LIMITED
To: FUJITSU MICROELECTRONICS LIMITED
Reel/Frame 021976/0876 →