Soft lithographic process for fabricating integrated ITO electrode-liquid crystal alignment layers

1. A method for forming a flexible back plate for a display on a nonlinear roller-based system having a plurality of stations comprising the steps of:

forming an indium tin oxide (ITO) layer on a flexible substrate:

patterning the ITO layer with etch-resist material and form action protected areas to define electrode lines;

etching the ITO layer in areas unprotected by etch-resist material; and

forming light separating material in recesses between electrode lines.

2. A method for forming a flexible faceplate for a display on a nonlinear roller-based system having a plurality of stations comprising the steps of:

forming light separating a material on a flexible substrate to define color filter lines;

forming color filter lines in areas between the light separating material, with each color filter line having a height greater than the light separating material;

forming an indium tin oxide (ITO) layer over the color filter lines and light separating material;

depositing etch-resist on the color filter lines; and

etching the ITO from recesses between the color filter lines over the light separating material.

3. A method for forming a faceplate for a display on a flexible backing on a nonlinear roller-based system having a plurality of stations, with at least one station being nonlinear, comprising the steps of:

(a) transporting the flexible backing with a first polarizing film material thereon to a first station for dispensing, defining, and curing a first filter material at a plurality of spaced locations on the first polarized film material;

(b) transporting the flexible backing with the first polarizing film material with the first filter material formed at step (a) thereon to a second station for dispensing, defining, and curing a second filter material on the first polarized film material at a plurality of locations adjacent to and spaced from the first filter material;

(c) transporting the flexible backing with the first polarizing film material with the first and second filter material formed at steps (a) and (b) thereon to a third station for dispensing, defining, and curing a third filter material on the first polarized film material at a plurality of locations adjacent to and spaced from the second and first filter material;

(d) transporting the flexible backing with the first polarizing film material with the first, second, and third filter material formed that steps (a), (b), and (c), respectively, thereon to a fourth station for depositing electrode material over the first, second, and third filter material and the first polarizing film material exposed between the first, second, and third filter material;

(e) transporting the flexible backing with the first polarizing film material with the first, second, and third filter material thereon and the electrode material deposited at step (d) to a fifth station for depositing patterned etch-resist on the electrode material over the first, second, and third filter material;

(f) transporting the flexible backing with the first polarizing film material with the first, second, and third filter material thereon and the electrode material deposited at step (d) with patterned etch-resist thereon to a sixth station for removing the electrode material from areas on which patterned etch-resist is not deposited;

(g) transporting the flexible backing with the first polarizing film material with the first, second, and third filter material that have an electrode thereon to a seventh station for depositing etch-resist on each electrode for forming alignment structures therein; and

(h) transporting the flexible backing with the first polarizing film material with the first, second, and third filter material that have an electrode thereon with patterned etch-resist for forming alignment structures therein to an eighth station for removing the electrode material from areas on which patterned etch-resist is not deposited.

4. The method as recited in claim 3 , wherein the first station is nonlinear.

5. The method as recited in claim 3 , wherein the second station is nonlinear.

6. The method as recited in claim 3 , wherein the third station is nonlinear.

7. The method as recited in claim 3 , wherein the fourth station is nonlinear.

8. The method as recited in claim 3 , wherein the fifth station is nonlinear.

9. The method as recited in claim 3 , wherein the sixth station is nonlinear.

10. The method as recited in claim 3 , wherein the seventh station is nonlinear.

11. The method as recited in claim 3 , wherein the eighth station is nonlinear.

12. The method as recited in claim 3 , wherein the electrode material includes indium tin oxide (ITO).

13. A method for forming a back plate for a display on a flexible backing on a nonlinear roller-based system having a plurality of stations, with at least one station being nonlinear, comprising the steps of:

(a) transporting the flexible backing with a first polarizing film material thereon to a first station for depositing an electrode material on the first polarizing film material;

(b) transporting the flexible backing with the first polarizing film material with the electrode material thereon to a second station for depositing patterned etch-resist on the electrode material to define a plurality of spaced electrodes in the electrode material;

(c) transporting the flexible backing with the first polarizing film material with the electrode material that has patterned etch-resist thereon to define a plurality of spaced electrodes to a third station for removing the electrode material from areas on which the patterned etch-resist is not deposited;

(d) transporting the flexible backing with the first polarizing film material with the plurality of electrodes thereon to a fourth station for depositing etch-resist on the plurality of electrodes for forming alignment structures therein;

(e) transporting the flexible backing with the first polarizing film material with the plurality of electrodes thereon that have etch-resist for forming alignment structures therein to a fifth station for removing the electrode material from areas of the plurality of electrodes on which etch-resist is not deposited; and

(f) transporting the flexible backing with the first polarizing film material with the plurality of electrodes with alignment structure therein to a sixth station for forming spacers between the plurality of electrodes, with the spacers having a height greater than the electrodes.

14. The method as recited in claim 13 , wherein the first station is nonlinear.

15. The method as recited in claim 13 , wherein the second station is nonlinear.

16. The method as recited in claim 13 , wherein the third station is nonlinear.

17. The method as recited in claim 13 , wherein the fourth station is nonlinear.

18. The method as recited in claim 13 , wherein the fifth station is nonlinear.

19. The method as recited in claim 13 , wherein the sixth station is nonlinear.

20. The method as recited in claim 13 , wherein the electrode material includes indium tin oxide (ITO).