Osteoconductive/osteoinductive titanium/titanium alloy implant comprising an additional element in the titanium oxide, obtained by anodic oxidation. The implant comprises an additional element in the titanium oxide such as calcium, phosphor or sulphur. The invention also relates to a process of producing the implants.
1. Osteoconductive/osteoinductive titanium/titanium alloy implant comprising:
a titanium oxide with anodic incorporation of an additional element,
said additional element being a single one element chosen from the group consisting of calcium, phosphor and sulphur, wherein,
said implant exhibits a cross-section of an osteoconductive/osteoinductive oxide layer, which consists of a double layer structure of an upper porous layer of the titanium oxide with anodic incorporation of the additional element and a lower compact barrier layer of the titanium oxide with anodic incorporation of the additional element,
wherein the lower barrier layer comprises less of said additional element than the upper porous layer, and the upper porous layer exhibits more than about 11% porosity and less than about 30%.
2. Implant according to claim 1 , wherein the porous upper layer exhibits an open structure comprising a plurality of shallow craters.
3. Implant according to claim 1 , wherein the upper layer has a thickness below about 1000 nm.
4. Implant according to claim 1 , wherein the lower barrier layer has a thickness ranging between about 300 nm and 2000 nm.
5. Implant according to claim 1 , wherein the thickness of said osteoconductive/osteoinductive double layer-structured oxide containing an additional element is from 300 to 3000 nm.
6. Implant according to claim 1 , wherein the lower barrier layer does not include any pores/craters or channels.
7. Implant according to claim 1 , wherein the upper layer has a thickness in the range of 100-500 nm.
8. Implant according to claim 1 , wherein the lower barrier layer has a thickness ranging between in the range of 600-1500 nm.
9. Implant according to claim 1 , wherein the thickness of said osteoconductive/osteoinductive double layer-structured oxide containing an additional element is between 800 and 1500 nm.
10. Osteoconductive/osteoinductive titanium/titanium alloy implant comprising:
a titanium oxide with anodic incorporation of an additional element,
said additional element being a single one element chosen from the group consisting of calcium, phosphor and sulphur, wherein,
said implant exhibits a cross-section of an osteoconductive/osteoinductive oxide layer, which consists of a double layer structure of an upper porous layer of the titanium oxide with anodic incorporation of the additional element and a lower compact barrier layer of the titanium oxide with anodic incorporation of the additional element,
wherein the lower barrier layer comprises less of said additional element than the upper porous layer,
wherein the crystal structure of titanium oxide is amorphous and/or amorphous and anatase and/or amorphous, anatase and rutile.
11. Osteoconductive/osteoinductive titanium/titanium alloy implant comprising:
a titanium oxide with anodic incorporation of an additional element,
said additional element being a single one element chosen from the group consisting of calcium, phosphor and sulphur, wherein,
said implant exhibits a cross-section of an osteoconductive/osteoinductive oxide layer, which consists of a double layer structure of an upper porous layer of the titanium oxide with anodic incorporation of the additional element and a lower compact barrier layer of the titanium oxide with anodic incorporation of the additional element,
wherein the lower barrier layer comprises less of said additional element than the upper porous layer,
wherein the relative concentration of the additional element incorporated into the anodic oxide layer formed on titanium/titanium alloy implants increases with the thickness of the oxide layer containing an additional element.
12. Osteoconductive/osteoinductive titanium/titanium alloy implant comprising:
a titanium oxide with anodic incorporation of an additional element,
said additional element being a single one element chosen from the group consisting of calcium, phosphor and sulphur, wherein,
said implant exhibits a cross-section of an osteoconductive/osteoinductive oxide layer, which consists of a double layer structure of an upper porous layer of the titanium oxide with anodic incorporation of the additional element and a lower compact barrier layer of the titanium oxide with anodic incorporation of the additional element,
wherein the lower barrier layer comprises less of said additional element than the upper porous layer,
wherein the relative concentration of the additional element in of the oxide layer of said implant is between 1% and 50%.
13. Osteoconductive/osteoinductive titanium/titanium alloy implant comprising:
a titanium oxide with anodic incorporation of an additional element,
said additional element being a single one element chosen from the group consisting of calcium, phosphor and sulphur, wherein,
said implant exhibits a cross-section of an osteoconductive/osteoinductive oxide layer, which consists of a double layer structure of an upper porous layer of the titanium oxide with anodic incorporation of the additional element and a lower compact barrier layer of the titanium oxide with anodic incorporation of the additional element,
wherein the lower barrier layer comprises less of said additional element than the upper porous layer,
wherein the upper porous layer exhibits more than about 11% porosity and less than about 15%.
14. Osteoconductive/osteoinductive titanium/titanium alloy implant comprising:
a titanium oxide with anodic incorporation of an additional element,
said additional element being a single one element chosen from the group consisting of calcium, phosphor and sulphur, wherein,
said implant exhibits a cross-section of an osteoconductive/osteoinductive oxide layer, which consists of a double layer structure of an upper porous layer of the titanium oxide with anodic incorporation of the additional element and a lower compact barrier layer of the titanium oxide with anodic incorporation of the additional element,
wherein the lower barrier layer comprises less of said additional element than the upper porous layer,
wherein the relative concentration of the additional element in of the oxide layer of said implant is between 1% and 25%.