CMP for corrosion-free CoFe elements for magnetic heads
View Patent ↗A method of manufacture of magnetic heads which include CoFe elements using CMP is presented. The method includes providing a slurry of Al 2 O 3 , adjusting the concentration of H 2 O 2 in said slurry to within a range of 6–12% by volume and balancing mechanical polishing action. The balancing is done by adjusting the table speed of a mechanical polisher to within a range of 55–90 rpm, and adjusting polishing pressure to within a range of 5–7 psi. Also a magnetic head having elements made of CoFe material made by this method is disclosed.
1. A method of manufacture of magnetic heads which include CoFe elements using CMP, comprising:
A) providing magnetic heads which include CoFe elements;
B) providing a slurry including Al 2 O 3 and H 2 O 2 ;
C) adjusting the concentration of H 2 O 2 in said slurry to within a range of 6–12% by volume;
D) polishing said CoFe elements using said slurry; and
E) balancing mechanical polishing action.
2. The method of manufacture of magnetic heads of claim 1 , wherein C) includes: adjusting the table speed of a mechanical polisher to within a range of 55–90 rpm.
3. The method of manufacture of magnetic heads of claim 2 , wherein C) includes:
adjusting polishing pressure to within a range of 5–7 psi.
4. The method of manufacture of claim 1 , wherein:
said slurry of A) includes BTA (1H-benzotriazole).
5. The method of manufacture of claim 1 , wherein:
said slurry of A) includes Isothiazolone.
6. The method of manufacture of claim 1 , wherein:
the particle size of Al 2 O 3 is in the range of 50–500 nm.
7. The method of manufacture of claim 1 , wherein:
the pH of the slurry is in the range of 4–6.
8. A method of manufacture of magnetic heads which include CoFe elements using CMP, comprising:
A) providing magnetic heads which include both CoFe elements and Al 2 O 3 elements;
B) providing a slurry including Al 2 O 3 and H 2 O 2 ;
C) adjusting the concentration of H 2 O 2 in said slurry to within a range of 8–12% by volume;
D) polishing said CoFe elements and said Al 2 O 3 elements using said slurry; and
E) balancing mechanical polishing action.