IP Library Granted Patent US 7,144,518
Granted Patent B2
US 7,144,518 · App. 10/734,361 · Granted Dec 5, 2006

CMP for corrosion-free CoFe elements for magnetic heads

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Quick Facts
Patent No.
US 7,144,518
App. No.
10/734,361
Granted
Dec 5, 2006
Kind
B2
Abstract

A method of manufacture of magnetic heads which include CoFe elements using CMP is presented. The method includes providing a slurry of Al 2 O 3 , adjusting the concentration of H 2 O 2 in said slurry to within a range of 6–12% by volume and balancing mechanical polishing action. The balancing is done by adjusting the table speed of a mechanical polisher to within a range of 55–90 rpm, and adjusting polishing pressure to within a range of 5–7 psi. Also a magnetic head having elements made of CoFe material made by this method is disclosed.

Claims (23)

1. A method of manufacture of magnetic heads which include CoFe elements using CMP, comprising:

A) providing magnetic heads which include CoFe elements;

B) providing a slurry including Al 2 O 3 and H 2 O 2 ;

C) adjusting the concentration of H 2 O 2 in said slurry to within a range of 6–12% by volume;

D) polishing said CoFe elements using said slurry; and

E) balancing mechanical polishing action.

2. The method of manufacture of magnetic heads of claim 1 , wherein C) includes: adjusting the table speed of a mechanical polisher to within a range of 55–90 rpm.

3. The method of manufacture of magnetic heads of claim 2 , wherein C) includes:

adjusting polishing pressure to within a range of 5–7 psi.

4. The method of manufacture of claim 1 , wherein:

said slurry of A) includes BTA (1H-benzotriazole).

5. The method of manufacture of claim 1 , wherein:

said slurry of A) includes Isothiazolone.

6. The method of manufacture of claim 1 , wherein:

the particle size of Al 2 O 3 is in the range of 50–500 nm.

7. The method of manufacture of claim 1 , wherein:

the pH of the slurry is in the range of 4–6.

8. A method of manufacture of magnetic heads which include CoFe elements using CMP, comprising:

A) providing magnetic heads which include both CoFe elements and Al 2 O 3 elements;

B) providing a slurry including Al 2 O 3 and H 2 O 2 ;

C) adjusting the concentration of H 2 O 2 in said slurry to within a range of 8–12% by volume;

D) polishing said CoFe elements and said Al 2 O 3 elements using said slurry; and

E) balancing mechanical polishing action.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 5, 2016
From: HGST NETHERLANDS B.V.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 040820/0802 →
CHANGE OF NAME Recorded Oct 25, 2012
From: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
To: HGST NETHERLANDS B.V.
Reel/Frame 029341/0777 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 26, 2004
From: BERGEVIN, CHRISTOPHER W.; GUTHRIE, HUNG-CHIN; HARRIS, III, TOM KING; JIANG, MING; YANG, JOHN JAEKOYUN
To: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
Reel/Frame 015255/0929 →