IP Library Granted Patent US 7,405,035
Granted Patent B2
US 7,405,035 · App. 10/735,769 · Granted Jul 29, 2008

Pattern forming method and substance adherence pattern material

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Quick Facts
Patent No.
US 7,405,035
App. No.
10/735,769
Granted
Jul 29, 2008
Kind
B2
Abstract

The present invention relates to a pattern forming method comprising image-wise forming, on a surface of a substrate, a region having an ability to initiate polymerization, forming a graft polymer on the region by atom transfer radical polymerization, and adhering a substance to the graft polymer. The method can be applied for preparing an image forming material, a fine particle adsorption pattern material, a conductive pattern material, or the like by selecting a suitable substance.

Claims (14)

1. A pattern forming method, comprising image-wise forming, on a surface of a substrate, a region where an initiator having an ability to initiate polymerization is image-wise fixed over the whole area of the substrate and then image-wise exposing to light to inactivate the polymerization-initiating ability of the initiator in the region exposed to light so that the initiator fixed on the region not exposed to light maintains its activity, forming a graft polymer on the region by atom transfer radical polymerization to form a hydrophilic/hydrophobic pattern which includes regions having a graft polymer formed and regions having no graft polymer formed, and applying a substance to the hydrophilic or hydrophobic region of the hydrophilic/hydrophobic pattern,

wherein the atom transfer radical polymerization is conducted in the presence of a transition metal complex as a catalyst.

2. A pattern forming method according to claim 1 , wherein the region where an initiator having an ability to initiate polymerization is image-wise fixed is formed by fixing a polymerization initiator thereon and the graft polymer contains a monomer having hydrophilicity/hydrophobicity opposite to the hydrophilicity/hydrophobicity of the polymerization initiator.

3. A pattern forming method according to claim 1 , wherein the substance is a colorant.

4. A pattern forming method according to claim 3 , wherein the graft polymer contains a monomer having hydrophilicity/hydrophobicity opposite to the hydrophilicity/hydrophobicity of the polymerization initiator.

5. A pattern forming method according to claim 3 , wherein the colorant is a dye.

6. A pattern forming method according to claim 5 , wherein the dye has a charge opposite to a charge of the graft polymer.

7. A pattern forming method according to claim 1 , wherein the substance is fine particles.

8. A pattern forming method according to claim 7 , wherein the graft polymer has a polar group.

9. A pattern forming method according to claim 7 , wherein the fine particles each have a charge opposite to a charge of the graft polymer.

10. A pattern forming method according to claim 1 , wherein the substance is a conductive material.

11. A pattern forming method according to claim 10 , wherein the graft polymer has a polar group.

12. A pattern forming method according to claim 10 , wherein the conductive material is fine conductive particles each having a charge opposite to that of the graft polymer.

13. A pattern forming method according to claim 10 , wherein the conductive material is a conductive polymer comprising a conductive monomer which can be adsorbed by a functional group of the graft polymer through ionic force.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 16, 2003
From: KAWAMURA, KOICHI; KANO, TAKEYOSHI
To: FUJI PHOTO FILM CO., LTD.
Reel/Frame 014800/0595 →