Stabilizing plasma and generator interactions
View Patent ↗An approach for stabilizing the interactions between a plasma and the generator powering the plasma is provided. Reactive elements disposed between the power generator and plasma operate to modify the apparent impedance characteristics of the plasma such that the trajectory of the plasma load impedance as a function of power is substantially aligned locally with the contours of constant power output in impedance space. In this way, instabilities in the generator and plasma system are avoided because reinforcement or amplification of fluctuations in plasma impedance due to interactions between the generator and the plasma are reduced or eliminated. The reactive elements may be variable in order to align plasma trajectories and generator power contours under a range of process conditions.
1. A method of stabilizing a plasma, comprising:
a) providing a plasma processing system having a plasma chamber;
b) providing a power delivery system that furnishes alternating current power to the plasma chamber to create a plasma therein;
c) determining the impedance trajectory of the plasma at an operating condition; and
d) stabilizing the plasma by substantially matching the angle of the impedance trajectory of the plasma to a contour of constant power output of the power delivery system.
2. The method of claim 1 wherein the impedance trajectory of the plasma is substantially matched to the contour of constant power output of the power delivery system using trajectory matching circuitry.
3. The method of claim 2 wherein the trajectory matching circuitry comprises a network of reactive electrical elements.
4. The method of claim 3 wherein the network of reactive electrical elements is at least a third order network.
5. The method of claim 3 wherein the network of reactive electrical elements substantially matches both the steady state output impedance and the contour of constant power output of the power delivery system.
6. The method of claim 3 wherein the reactive value of at least one of the elements of the network is variable.
7. The method of claim 6 wherein the impedance trajectory of the plasma is determined during process operation and used to adjust the reactive value of the at least one of the elements of the network.
8. The method of claim 1 wherein the impedance trajectory of the plasma is substantially matched to the contour of constant power output of the power delivery system using a transmission line.
9. A plasma processing system, comprising:
a) a plasma chamber;
b) a power delivery system that furnishes alternating current power to the plasma chamber to create a plasma therein; and
c) trajectory matching circuitry that stabilizes the plasma by substantially matching the angle of the impedance trajectory of the plasma to a contour of constant power output of the power delivery system.
10. The system of claim 9 wherein the trajectory matching circuitry comprises a network of reactive electrical elements.
11. The system of claim 10 wherein the network of reactive electrical elements is at least a third order network.
12. The system of claim 10 wherein the network of reactive electrical elements substantially matches both the steady state output impedance and the contour of constant power output of the power delivery system.
13. The system of claim 10 wherein the reactive value of at least one of the elements of the network is variable.
14. The system of claim 13 , further comprising a trajectory match controller that determines the impedance trajectory of the plasma during process operation and adjusts the reactive value of the at least one of the elements of the network to stabilize the plasma.