Method of fabricating light-guide plate

1. A method of fabricating a light-guide plate, comprising steps of:

preparing an upper mold frame having an inclined inner surface and a lower mold frame having a space therein;

preparing a micro pattern plate having a surface including one of a plurality of grooves and a plurality of protrusions formed using photolithographic processes;

inserting the micro pattern plate into the space of the lower mold frame, the surface of the micro pattern plate facing the inclined inner surface of the upper mold frame;

positioning the upper and lower mold frames together; and

injecting light-guide plate forming material into a space between the upper and lower mold frames,

wherein the step of preparing the micro pattern plate includes:

preparing a plate for a micro pattern;

depositing an organic insulating layer on the plate;

applying a photoresist onto the organic insulating layer;

aligning a mask on the photoresist, the mask having a trapezoidal cross section in which two sides are of equal length and a side facing the PR is shorter than an opposite side;

exposing portions of the photoresist to ultra violet light;

developing the exposed portions of the photoresist to provide a plurality of remaining portions of the photoresist;

forming a plurality of triangular protrusions on the plate by anisotropically etching the organic insulating layer using the remaining portions of the photoresist; and plating the plate and the triangular protrusions with copper.

2. The method according to claim 1 , wherein the light-guide plate forming material includes polymethyl methacrylate (PMMA).

3. The method according to claim 1 , wherein an interval between adjacent ones of the grooves on the micro pattern plate is less than or equal to about 9 μm.

4. The method according to claim 3 , wherein the interval between the grooves is equal to about 0.5 μm.

5. The method according to claim 3 , wherein the light-guide plate has a raised carving pattern corresponding to the grooves is formed.

6. The method according to claim 1 , wherein an interval between adjacent ones of the protrusions on the micro pattern plate is less than or equal to about 9 μm.

7. The method according to claim 6 , wherein the intervals between the protrusions is equal to about 0.5 μm.

8. The method according to claim 6 , wherein the light-guide plate has a depressed engraving pattern corresponding to a plurality of the protrusions is formed.

9. The method according to claim 1 , wherein the organic insulating layer includes one of benzocyclobutene (BCB) and perfluorocyclobutane (PFCB).

10. A method of fabricating a light-guide plate, comprising steps of:

preparing an upper mold frame having an inclined inner surface and a lower mold frame having a space therein;

preparing a micro pattern plate having a surface including one of a plurality of grooves and a plurality of protrusions formed using photolithographic processes;

inserting the micro pattern plate into the space of the lower mold frame, the surface of the micro pattern plate facing the inclined inner surface of the upper mold frame;

positioning the upper and lower mold frames together; and

injecting light-guide plate forming material into a space between the upper and lower mold frames,

wherein the step of preparing the micro pattern includes:

preparing a plate;

depositing an organic insulating layer on the plate;

coating the organic insulating layer with a photoresist;

aligning a mask on the photoresist, the mask having a trapezoidal cross section in which two sides are of equal length and a side facing the photoresist is shorter than an opposite side;

exposing portions of the photoresist to ultra violet light;

developing the exposed portions of the photoresist to provide a plurality of remaining portions of the photoresist;

forming a plurality of triangular protrusions on the plate by anisotropically etching the organic insulating layer using the remaining portions of the photoresist;

depositing a micro pattern forming material on the plate and the triangular protrusions; and

removing the plate and the triangular protrusions thereby forming the micro pattern plate from the micro pattern forming material.

11. The method according to claim 10 , wherein the organic insulating layer includes one of benzocyclobutene (BCB) and perfluorocyclobutane (PFCB).

12. The method according to claim 10 , wherein the micro pattern forming material includes one of copper and nickel.

13. The method according to claim 10 , wherein the step of preparing the micro pattern plate includes plating the forming material after the step of removing the plate and the triangular protrusions.