Liquid crystal display device and method of fabricating the same

1. A liquid crystal display device, comprising:

a light-absorbing layer on a first substrate;

a first common electrode and a first data electrode on the first substrate;

a first liquid crystal layer having a helical alignment to reflect circularly polarized light at one direction according to an In-Plane switching mode electric field induced by the first common electrode and the first data electrode;

a second substrate on the first liquid crystal layer;

a second liquid crystal layer having a helical alignment on the second substrate to reflect circularly polarized light at a direction different from that in the first liquid crystal layer;

a third substrate on the second liquid crystal layer; and

a second common electrode and a second data electrode on one of the second and third substrates to control the second liquid crystal layer.

2. The device according to claim 1 , wherein the light-absorbing layer is formed between the lower substrate and the common electrode.

3. The device according to claim 1 , further comprising first and second alignment layers formed on opposing surfaces of the first and second substrates, respectively.

4. The device according to claim 1 , further comprising third and fourth alignment layers formed on opposing surfaces of the second and third substrates, respectively.

5. The device according to claim 1 , further comprising a fourth substrate between the first liquid crystal layer and the second substrate.

6. The device according to claim 5 , further comprising a phase difference plate between the fourth substrate and the second substrate.

7. The device according to claim 1 , wherein the first and second liquid crystal layers include cholesteric liquid crystal layers.

8. The device according to claim 1 , wherein the first and second liquid crystal layers include ferroelectric liquid crystal layers.

9. A liquid crystal display device, comprising:

a lower substrate;

an upper substrate disposed opposite to the lower substrate;

a middle substrate disposed between the lower and upper substrate;

a light-absorbing layer on the lower substrate;

a gate line, a gate electrode, a common line, and a common electrode on the lower substrate;

a gate insulating layer along an entire surface of the lower substrate;

a thin film transistor including a semiconductor layer on the gate insulating layer above the gate electrode, source and drain electrodes above both sides of the semiconductor layer, and the gate electrode;

a data line and a data electrode on the gate insulating layer perpendicular to the gate line;

a passivation layer on the lower substrate including the data electrode;

a first alignment layer on the passivation layer;

a black matrix layer on the upper substrate to prevent light leakage on the data line, the gate line, and the thin film transistor;

a second alignment layer on the upper substrate including the black matrix layer;

a third alignment layer on a first side of the middle substrate facing the lower substrate;

a fourth alignment layer on a second side of the middle substrate facing the upper substrate;

a first liquid crystal layer having a first helical alignment between the upper and middle substrates; and

a second liquid crystal layer having a second helical alignment different from the first helical alignment between the lower and middle substrates.

10. The device according to claim 9 , wherein the upper, middle, and lower substrates are formed of a transparent material.

11. The device according to claim 9 , wherein the light-absorbing layer is formed between the lower substrate and the common electrode.

12. The device according to claim 9 , wherein a voltage applied to the common electrode and the data electrode is proportional to a helical pitch of at least one of the first and second liquid crystal layers.

13. The device according to claim 9 , wherein the first and second alignment layers are not rubbed, or have weak anchoring energy.

14. The device according to claim 9 , wherein a helical axis of at least one of the first and second liquid crystal layers is perpendicular to the upper and lower substrates.

15. A method of fabricating a liquid crystal display device, comprising:

forming a light-absorbing layer on a first substrate;

forming a first common electrode and a first data electrode on the first substrate;

forming a first liquid crystal layer having a helical alignment to reflect circularly polarized light at one direction according to an In-Plane switching mode electric field induced by the first common electrode and the first data electrode;

providing a second substrate on the first liquid crystal layer;

forming a second liquid crystal layer having a helical alignment on the second substrate to reflect circularly polarized light at a direction different from that in the first liquid crystal layer;

providing a third substrate on the second liquid crystal layer; and

forming a second common electrode and a second data electrode on one of the second and third substrates to control the second liquid crystal layer.

16. The method according to claim 15 , wherein the light-absorbing layer is formed between the lower substrate and the common electrode.

17. The method according to claim 15 , further comprising forming first and second alignment layers on opposing surfaces of the first and second substrates, respectively.

18. The method according to claim 15 , further comprising forming third and fourth alignment layers on opposing surfaces of the second and third substrates, respectively.

19. The method according to claim 15 , further comprising providing a fourth substrate between the first liquid crystal layer and the second substrate.

20. The method according to claim 19 , further comprising providing a phase difference plate between the fourth substrate and the second substrate.

21. The method according to claim 15 , wherein the first and second liquid crystal layers include cholesteric liquid crystal layers.

22. The method according to claim 15 , wherein the first and second liquid crystal layers include ferroelectric liquid crystal layers.

23. A method of fabricating a liquid crystal display device, comprising:

forming a light-absorbing layer on a lower substrate;

forming a gate line, a gate electrode, a common line, and a common electrode on the lower substrate;

forming a gate insulating layer along an entire surface of the lower substrate;

forming a thin film transistor on the lower substrate including a semiconductor layer on the gate insulating layer above the gate electrode, source and drain electrodes above both sides of the semiconductor layer, and the gate electrode;

forming a data line and a data electrode on the gate insulating layer perpendicular to the gate line;

forming a passivation layer on the lower substrate including the data electrode;

forming a first alignment layer on the passivation layer;

forming a black matrix layer on an upper substrate to prevent light leakage on the data line, the gate line, and the thin film transistor;

forming a second alignment layer on the upper substrate including the black matrix layer;

forming a first liquid crystal layer having a first helical alignment between the upper and lower substrates;

forming a middle substrate between the upper and lower substrates; and

forming a second liquid crystal layer having a second helical alignment different from the first helical alignment between the middle substrate and one of the upper and lower substrates.

24. The method according to claim 23 , wherein the upper and lower substrates are formed of a transparent material.

25. The method according to claim 23 , wherein the light-absorbing layer is formed between the lower substrate and the common electrode.

26. The method according to claim 23 , wherein a voltage applied to the common electrode and the data electrode is proportional to a helical pitch of at least one of the first and second liquid crystal layers.

27. The method according to claim 23 , wherein the first and second alignment layers are not rubbed, or have weak anchoring energy.

28. The method according to claim 23 , wherein a helical axis of at least one of the first and second liquid crystal layers is perpendicular to the upper and lower substrates.