Lithographic apparatus and method of manufacturing a device

1. A lithographic projection apparatus, comprising:

a radiation system constructed to provide a beam of radiation;

a support structure to support a patterning device, said patterning device serving to pattern said beam of radiation according to a desired pattern and form a patterned beam;

a substrate table for supporting a substrate;

a projection system that projects said patterned beam onto a target portion of said substrate; and

at least one holding structure having at least one compliant member constructed to hold a pimple plate, said pimple plate constructed to hold one of said patterning device and said substrate.

2. A lithographic projection apparatus according to claim 1 , wherein said at least one compliant member includes a membrane.

3. A lithographic projection apparatus according to claim 1 , wherein said at least one compliant member includes a pair of parallel flaps.

4. A lithographic projection apparatus according to claim 3 , wherein each of said pair of parallel flaps is supported along the respective length of each of said pair of parallel flaps.

5. A lithographic projection apparatus according to claim 1 , wherein said pimple plate is substantially rigid in comparison with said at least one compliant member.

6. A lithographic projection apparatus according to claim 1 , further comprising:

a plurality of supports for supporting said at least one of said patterning device and said substrate and each of said plurality of supports extending substantially perpendicular to a plane of said at least one of said patterning device and said substrate.

7. A lithographic projection apparatus according to claim 6 , wherein said plurality of supports are arranged to support said pimple plate at Bessell points.

8. A lithographic projection apparatus according to claim 7 , wherein said plurality of supports is three fixed supports.

9. A lithographic projection apparatus according to claim 6 , wherein at least one of said plurality of supports provides electrical contact with said pimple plate.

10. A lithographic projection apparatus according to claim 1 , further comprising:

an electrostatic clamp constructed to clamp said pimple plate to at least one of said one of said patterning device and said substrate and said at least one compliant member.

11. A lithographic projection apparatus according to claim 1 , wherein said beam of radiation comprises EUV radiation.

12. A lithographic projection apparatus according to claim 1 , wherein said at least one of said support structure and said substrate table includes said at least one holding structure.

13. A method of manufacturing a device using a lithographic projection apparatus comprising:

providing a beam of radiation;

providing a support structure for supporting a patterning device;

using the patterning device to pattern the beam of radiation according to a desired pattern forming a patterned beam;

providing a substrate table for supporting a substrate;

holding one of the patterning device and the substrate on a pimple plate during operation of the apparatus;

holding the pimple plate on at least one compliant member; and

projecting the patterned beam onto a target portion of the substrate.

14. A lithographic projection apparatus, comprising:

a radiation system constructed to provide a beam of radiation;

a pimple plate having protrusions extending from a surface, said pimple plate constructed to hold a removable item on said protrusions;

a holding structure having at least one compliant member constructed to resiliently hold said pimple plate.

15. A lithographic projection apparatus according to claim 14 ,wherein:

said removable item is one of a patterning device serving to pattern said beam of radiation according to a desired pattern and form a patterned beam and a substrate.