Method for producing light-transmitting electromagnetic wave-shielding film, light-transmitting electromagnetic wave-shielding film and plasma display panel using the shielding film

1. A method for producing a light-transmitting electromagnetic wave-shielding film having a conductive metal portion and a light transmitting portion, which comprises

exposing a silver salt-containing layer to an electromagnetic wave, wherein the silver salt-containing layer contains a silver salt and the silver salt-containing layer is provided on a support,

developing said exposed silver salt-containing layer with a development technique used for a silver salt photographic film so as to form a metal silver portion, and

subjecting the metal silver portion to physical development and/or plating to form the conductive metal portion consisting of the metal silver portion carrying conductive metal particles;

wherein the silver salt-containing layer contains Ag and a binder and has an Ag/binder volume ratio of 1/1 or higher.

2. The method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , wherein the silver salt in the silver salt-containing layer is a silver halide.

3. The method for producing a light-transmitting electromagnetic wave-shielding film according to claim 2 , wherein the silver halide consists mainly of silver bromide.

4. The method for producing a light-transmitting electromagnetic wave-shielding film according to claim 2 , wherein the silver halide contains a rhodium compound and/or an iridium compound.

5. The method for producing a light-transmitting electromagnetic wave-shielding film according to claim 2 , wherein the silver halide contains Pd(II) ions and/or Pd metal.

6. A method for producing a light-transmitting electromagnetic wave-shielding film according to claim 2 , wherein the silver halide functions as an optical sensor.

7. The method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , wherein the silver salt in the silver salt-containing layer has a diameter as sphere of 0.1 to 100 nm.

8. The method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , wherein the developer used for the development of the silver salt-containing layer is a lith developer.

9. The method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , wherein an exposed portion after the development contains the metal silver at a content of 50% by weight or more based on the weight of silver contained in the exposed portion before the exposure.

10. The method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , wherein the plating is performed by electroless plating.

11. The method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , wherein the surface of the conductive metal portion is further subjected to a blackening treatment.

12. The method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , wherein the light-transmitting electromagnetic wave-shielding film has a surface resistance of 2.5 Ω/sq or lower after the physical development and/or plating, and/or the light-transmitting portion has a transmittance of 95% or higher.

13. A method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , wherein the support is a plastic film, a plastic plate or a glass plate.

14. A method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , additionally comprising removing silver-salt from unexposed regions of the silver-salt containing layer.

15. A method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , wherein the binder includes water-soluble polymers.

16. A method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , wherein the binder includes gelatin.

17. A method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , additionally comprising fixing the developed and exposed silver salt-containing layer.

18. The method for producing a light-transmitting electromagnetic wave-shielding film according to claim 1 , wherein the light-transmitting electromagnetic wave-shielding film has an aperture ratio of 85% or higher.

19. A method for producing a light-transmitting electromagnetic wave-shielding film having a conductive metal portion and a light transmitting portion, which comprises

exposing a silver salt-containing layer to an electromagnetic wave, wherein the silver salt-containing layer contains a silver salt and the silver salt-containing layer is provided on a support,

developing said exposed silver salt-containing layer with a development technique used for a silver salt photographic film so as to form a metal silver portion, and

subjecting the metal silver portion to physical development and/or plating to form the conductive metal portion consisting of the metal silver portion carrying conductive metal particles;

wherein the silver salt-containing layer contains Ag and a binder and has an Ag/binder volume ratio of 1/1 or higher, and

wherein the light transmitting portion does not substantially contain physical development nuclei.