IP Library › Granted Patent US 7,229,273
Granted Patent B2
US 7,229,273 · App. 10/755,997 · Granted Jun 12, 2007

Imprint lithography template having a feature size under 250 nm

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,229,273
App. No.
10/755,997
Granted
Jun 12, 2007
Kind
B2
Abstract

The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.

Claims (13)

1. A template comprising:

a mold having a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of said plurality of protrusions and a nadir of any of said plurality of recessions being less than 250 nm, wherein said template comprises first and second sides disposed opposite to each other, with said first side comprising said plurality of protrusions and said plurality of recessions, wherein said second side comprises a plurality of recessions.

2. The template as recited in claim 1 wherein said plurality of recessions comprises a first set of recessions having a first depth and a second set of recessions having a second depth.

3. The template as recited in claim 2 wherein said first depth may be less than 250 nm.

4. The template as recited in claim 2 wherein said second depth is greater than said first depth.

5. The template as recited in claim 1 wherein said template comprises silicon, silicon dioxide, silicon germanium carbon, gallium nitride, silicon germanium, sapphire, gallium arsinide, epitaxial silicon, polysilicon, gate oxide, quartz, or a combination thereof.

6. A template comprising:

a body having a first surface disposed opposite a second surface, wherein said second surface comprises a plurality of recessions; and

a plurality of protrusions and a plurality of recessions, disposed on said first surface, with a distance between a zenith of any of said plurality of protrusions and a nadir of any of said plurality of recessions being less than 250 nm.

7. The template as recited in claim 6 wherein said plurality or recessions comprises a first set of recessions having a first depth and a second set of recessions having a second depth.

8. The template as recited in claim 7 wherein said first set of recessions may be less than 250 nm.

9. The template as recited in claim 7 wherein said second depth is greater than said first depth.

10. The template as recited in claim 6 wherein said template comprises silicon, silicon dioxide, silicon germanium carbon, gallium nitride, silicon germanium, sapphire, gallium arsinide, epitaxial silicon, polysilicon, gate oxide, quartz, or a combination thereof.