Programmable imprint lithography template
View Patent ↗A template for imprint lithography (IL) that reduces significantly template production costs by allowing the same template to be re-used for several technology generations. The template is composed of an array of spaced-apart moveable and individually addressable rods or plungers. Thus, the template can be configured to provide a desired pattern by programming the array of plungers such that certain of the plungers are in an “up” or actuated configuration. This arrangement of “up” and “down” plungers forms a pattern composed of protruding and recessed features which can then be impressed onto a polymer film coated substrate by applying a pressure to the template impressing the programmed configuration into the polymer film. The pattern impressed into the polymer film will be reproduced on the substrate by subsequent processing.
1. A template for imprint lithography comprising a two-dimensional array of spaced-apart plungers arranged on a surface, wherein the plungers are each individually addressable and actuated to move in a vertical direction and wherein the plungers comprise a plunger and capping wafer; and actuating means.
2. The template of claim 1 , wherein the plungers are circular in cross-section.
3. The template of claim 1 , wherein the plungers are made from silicon.
4. The template of claim 3 , wherein the plungers are fabricated from silicon oriented along the (100) plane.
5. The template of claim 1 , wherein said actuating means include electrostatic, thermal, pressure, microfludic, or magnetic actuation.
6. The template of claim 1 , wherein the plungers are spaced from about 0.5 to about 2 μm apart.
7. A method for forming a lithographic pattern, comprising:
providing a substrate having a deformable polymer film deposited thereon;
actuating the plungers of the template of claim 1 to provide a pattern of protruding and recessed features;
urging the patterned template at a molding pressure into the polymer film, thereby transferring the template pattern onto the polymer film;
freeing the template from the film;
processing the patterned polymer film to remove the thin portions of the film; and
etching the substrate to reproduce the template pattern.
8. The method of claim 7 , further including the step of stepping the template over the surface of the polymer film.
9. A method for forming a multilayer device, comprising the steps of:
preparing a lithographic pattern by the method of claim 7 ;
reconfiguring the template to form a new pattern of protruding and recessed features; and
repeating the steps of urging, freeing, processing and etching to form a multilayer device.