Multi junction APS with dual simultaneous integration
View Patent ↗A new kind of pixel is formed of two floating diffusions of different sizes and different conductivity type. The two floating diffusions have different image characteristics, and hence form a knee-shaped slope.
1. A semiconductor device, comprising:
a substrate;
a semiconductor well, formed in said substrate;
a plurality of floating diffusion regions, each having a different size and each in contact with said semiconductor well; and
a plurality of output transistors, each of said output transistors coupled to a respective one of said plurality of floating diffusion regions.
2. The device of claim 1 , wherein each of said plurality of floating diffusion regions is formed at a surface of the semiconductor well.
3. The device of claim 1 , further comprising:
an active oxide covering a surface of said semiconductor well.
4. The device of claim 1 , wherein each of said floating diffusion regions further is coupled to its own reset transistor, for controllably supplying a reset level in response to a reset signal.
5. The device of claim 1 , wherein said semiconductor substrate is of a first conductivity type and said semiconductor well is of a second conductivity type different from said first conductivity type.
6. An image sensor, comprising:
a semiconductor substrate;
a first semiconductor well, formed within said semiconductor substrate;
a plurality of floating diffusion regions, each of a different size and each at least partially formed in said first semiconductor well;
a plurality of transistor connection elements, each enabling connection to a respective one of said plurality of floating diffusion regions, to obtain outputs indicative of an amount of light collected thereby; and
a photosensor, disposed on said semiconductor substrate, for supplying charged based upon light incident upon said photosensor to said floating diffusion regions.
7. The sensor of claim 6 , further comprising:
a plurality of reset elements, each respectively connected to reset a respective one of said plurality of floating diffusion regions.
8. The sensor of claim 6 , wherein said semiconductor substrate is P-type, said semiconductor well is N-type, and said plurality of floating diffusion regions include at least one N-type region and at least one P-type region.
9. The sensor of claim 6 , wherein at least one of said floating diffusion regions surround another one of said floating diffusion regions.
10. The sensor of claim 6 , wherein when said sensor is operational said semiconductor well is fully depleted.
11. A method of converting light to a signal, comprising:
receiving light simultaneously in a plurality of floating diffusion regions, each having a different size, each having a conductivity type, and each producing an output indicative of a different gradation of the incoming light; and
sampling each of said floating diffusion regions using a transistor.
12. The method of claim 11 , wherein each said transistor used to sample a floating diffusion region has a same conductivity type as the floating diffusion region being sampled.