IP Library Granted Patent US 6,878,945
Granted Patent B1
US 6,878,945 · App. 10/759,095 · Granted Apr 12, 2005

Vaporizer for ion source

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 6,878,945
App. No.
10/759,095
Granted
Apr 12, 2005
Kind
B1
Abstract

A vaporizer is provided for delivering a solid source, such as arsenic for example that is vaporized in a crucible, into an arc chamber through a nozzle. The vaporizer includes a nozzle formed with a gas inlet port formed in upward orientation and located downward from the upper end of the inner surface of the crucible. Here, when the crucible has an inner diameter of 26 mm for example, the gas inlet port is preferably formed at a position approximately 1.1 mm below the upper end of the inner surface of the crucible, thereby facilitating the introduction of the gas from the gas inlet port and preventing clogging of the nozzle.

Claims (9)

1. A vaporizer for vaporizing a solid source to deliver the vaporized source into an ionization chamber of an ion implantation apparatus, comprising:

a nozzle having a gas inlet port formed in upward orientation, said gas inlet port being located a predetermined distance downward from an upper end of an inner surface of a crucible for vaporizing the solid source therein, said predetermined distance being determined so that the vaporized source is delivered from the crucible to the ionization chamber through the gas inlet port of the nozzle even though a pressure difference between the crucible and the ionization chamber is small.

2. A vaporizer according to claim 1 , wherein said predetermined distance of said gas inlet port from the upper end of the inner surface of crucible is approximately 1.1 mm when the crucible has an inner diameter of 26 mm.

3. A vaporizer according to claim 1 , wherein said solid source is arsenic.

4. A vaporizer for vaporizing a solid source to deliver the vaporized source into an ionization chamber an ion implantation apparatus, comprising:

a nozzle having a plurality of gas inlet ports formed in an upper portion of a crucible for vaporizing the solid source therein, the number of the gas inlet ports being determined so that the vaporized source is delivered from the crucible to the ionization chamber through the gas inlet ports of the nozzle even though a pressure difference between the crucible and the ionization chamber is small.

5. A vaporizer according to claim 4 , wherein the number of the gas inlet ports is two.

6. A vaporizer according to claim 5 , wherein the nozzle includes the two gas inlet ports branched from a center of the crucible such that the two gas inlet ports are symmetrically formed at approximately 45 degrees to a vertical central axis of the crucible.

7. A vaporizer according to claim 4 , wherein said solid source is arsenic.

Assignments (2)
CHANGE OF NAME Recorded Dec 24, 2008
From: OKI ELECTRIC INDUSTRY CO., LTD.
To: OKI SEMICONDUCTOR CO., LTD.
Reel/Frame 022052/0797 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 20, 2004
From: TANIGUCHI, KAZUHIRO
To: OKI ELECTRIC INDUSTRY CO., LTD.
Reel/Frame 014902/0519 →