Gas barrier laminate film and method for producing same
View Patent ↗In a method for producing a gas barrier laminate film comprising the step of applying a mixture containing at least one kind of alkoxysilane, an acid catalyst and a hydrophilic resin to a polymer base film to form a coating layer, the acid catalyst is contained in the mixture in an amount of 0.3 to 5.0 molar equivalents with respect to 1 molar equivalent of the alkoxysilane. There are provided a gas barrier laminate film having superior gas barrier property and a method for producing it.
1. A method for producing a gas barrier laminate film comprising the step of applying a mixture containing at least one kind of alkoxysilane, an acid catalyst and a hydrophilic resin to a polymer base film to form a coating layer, wherein the acid catalyst is contained in the mixture in an amount of 0.3 to 5.0 molar equivalents with respect to 1 molar equivalent of the alkoxysilane, and the polymer base film contains an inorganic layered compound.
2. The method for producing a gas barrier laminate film according to claim 1 , wherein the hydrophilic resin is a polyvinyl alcohol resin.
3. The method for producing a gas barrier laminate film according to claim 1 , wherein the hydrophilic resin is contained in the mixture in an amount of 0.1 time or more of the weight of SiO 2 in the same molar number as the alkoxysilane.
4. The method for producing a gas barrier laminate film according to claim 1 , wherein the acid catalyst is hydrochloric acid, nitric acid, formic acid, acetic acid or oxalic acid.
5. The method for producing a gas barrier laminate film according to claim 1 , wherein the inorganic layered compound is fluorine tetrasilicon mica.
6. The method for producing a gas barrier laminate film according to claim 1 , wherein the polymer base film is prepared from a resin kneaded with an inorganic layered compound.
7. The method for producing a gas barrier laminate film according to claim 1 , wherein the polymer base film has a light transmission of 80% or more.
8. The method for producing a gas barrier laminate film according to claim 1 , wherein the polymer base film has a thickness of 5 to 500 μm.
9. The method for producing a gas barrier laminate film according to claim 1 , wherein the coating layer has a thickness of 100 to 1000 nm.
10. The method for producing a gas barrier laminate film according to claim 1 , wherein the acid catalyst is contained in the mixture in an amount of 0.5 to 2.5 molar equivalents with respect to 1 molar equivalent of the alkoxysilane.
11. A gas barrier laminate film, which can be obtained by the production method according to claim 1 .
12. The gas barrier laminate film according to claim 11 , wherein the coating layer has a silicon density of 0.65 g/cm 3 or more at 25° C.
13. The gas barrier laminate film according to claim 11 , wherein the coating layer has a silicon density of 0.75 g/cm 3 or more at 25° C.
14. The gas barrier laminate film according to claim 11 , wherein the coating layer contains a polysilicate.
15. The gas barrier laminate film according to claim 11 , wherein the coating layer contains the hydrophilic resin in an amount of 0.23 time or more of the weight of silicon contained in the coating layer.
16. A substrate comprising the gas barrier laminate film according to claim 11 .
17. An image display device comprising the gas barrier laminate film according to claim 11 .
18. A liquid crystal display device comprising the gas barrier laminate film according to claim 11 .
19. An organic EL device comprising the gas barrier laminate film according to claim 11 .