IP Library Granted Patent US 6,989,324
Granted Patent B2
US 6,989,324 · App. 10/759,589 · Granted Jan 24, 2006

Fabrication method for arranging ultra-fine particles

Assignee: The Regents of the University of California
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Quick Facts
Patent No.
US 6,989,324
App. No.
10/759,589
Granted
Jan 24, 2006
Kind
B2
Abstract

A method and resultant device, in which metal nanoparticles are self-assembled into two-dimensional lattices. A periodic hole pattern (wells) is fabricated on a photoresist substrate, the wells having an aspect ratio of less than 0.37. The nanoparticles are synthesized within inverse micelles of a polymer, preferably a block copolymer, and are self-assembled onto the photoresist nanopatterns. The nanoparticles are selectively positioned in the holes due to the capillary forces related to the pattern geometry, with a controllable number of particles per lattice point.

Claims (34)

1. A fabrication method for arranging ultra-fine particles into arrays of wells, comprising:

a) providing a substrate;

b) forming wells with an aspect ratio of less than 0.37 through the surface of said substrate;

c) forming micelles containing nanoparticles; and

d) self-assembling the micelles in said wells.

2. The fabrication method of claim 1 in which the wells have an aspect ratio of less than or equal to 0.3.

3. The fabrication method of claim 1 wherein the nanoparticles are metal nanoparticles.

4. The fabrication method of claim 3 wherein the metal is cobalt.

5. The fabrication method of claim 1 wherein said nanoparticles have diameters of 0.5 to 500 nm and said wells are less than 1 μm in diameter.

6. The fabrication method of claim 1 wherein the diameter of said micelles in dry condition is 0.01 to 1.0 times the diameter of said wells.

7. The fabrication method of claim 1 wherein the diameter of said micelles in solution is less than 1.5 times the diameter of said wells.

8. The fabrication method of claim 1 wherein said micelles are formed by steps comprising:

a) adding inverse micelles in a solution of hydrophobic liquid;

b) synthesizing nanoparticles within said inverse micelles; and

c) self-assembling the micelles in said wells.

9. The fabrication method of claim 8 in which the micelles are self-assembled in said wells by dipping said substrate into a solution of the micelles.

10. The fabrication method of claim 8 in which the micelles are self-assembled in said wells by spin-casting the micelles onto the surface of said substrate.

11. The fabrication method of claim 8 in which the hydrophobic liquid is toluene.

12. The fabrication method of claim 1 wherein the number of said nanoparticles within said wells is controlled by process parameters.

13. The fabrication method of claim 12 wherein the process parameters comprise a parameter selected from a group consisting of micelle concentration, time period for dip-coating, spinning speed for spin coating, temperature, solvent evaporation speed, selection of solvent, selection of micelle composition, selection of substrate, and selection of photoresist material.

14. The fabrication method of claim 1 , wherein said wells are arranged in an ordered manner.

15. The fabrication method of claim 1 , wherein said wells are arranged with periodicity.

16. The fabrication method of claim 1 , wherein said wells are arranged in a random manner.

17. The fabrication method of claim 1 wherein said wells are formed using electron beam lithography.

18. The fabrication method of claim 1 wherein said wells are formed using UV irradiation.

19. The fabrication method of claim 1 wherein said wells are formed using holographic lithography.

20. The fabrication method of claim 1 wherein said wells are in the form of periodic elongate grooves.

21. The fabrication method of claim 1 wherein said wells are 100–200 nm deep.

22. A fabrication method for arranging ultra-fine particles into an array of wells, comprising:

coating a GaAs substrate surface with a photo sensitive chemical resistant to acid;

forming wells with aspect ratios less than 0.37 through the surface of said substrate using holographic lithography; and

self-assembling micelles containing cobalt nanoparticles in said wells.

23. The fabrication method of claim 22 in which the micelles are self-assembled in said wells by dip casting.

24. The fabrication method of claim 22 in which the micelles are self-assembled in said wells by spin casting.

Assignments (2)
LICENSE Recorded Aug 2, 2016
From: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, ACTING THROUGH ITS OFFICE OF TECHNOLOGY & INDUSTRY ALLIANCES AT ITS SANTA BARBARA CAMPUS
To: HANCHUCK TRUST LLC
Reel/Frame 039317/0538 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 15, 2004
From: LEE, SEUNG-HEON; DIANA, FREDERIC S.; BADOLATO, ANTONIO; PETROFF, PIERRE M.; KRAMER, EDWARD J.
To: REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE
Reel/Frame 014906/0792 →
Continuity (1)
Related Publication 20050158988A1 · Jul 21, 2005