Micro-fluidic anti-microbial filter
View Patent ↗An anti-microbial filter ( 105 ) for a micro-fluidic system ( 100 ) includes a silicon-based filter membrane ( 213 ) having holes ( 218 ) formed therein. The membrane ( 213 ) is formed on a substrate ( 211 ). One side of the filter membrane ( 213 ) has an anti-microbial coating ( 216 ) between the holes ( 218 ) on the filter membrane ( 213 ) and the other side can include filter supports formed from a silicon substrate. A method for making the anti-microbial filter ( 105 ) includes forming a filter membrane ( 213 ) on a substrate ( 211 ), forming holes ( 218 ) in the membrane ( 213 ) by providing a filter mask ( 215 ) and etching holes ( 218 ) through holes ( 222 ) in the mask ( 215 ). Then portions of the substrate ( 211 ) are removed from the filter membrane ( 213 ) using a masking and etching process to expose the holes ( 218 ). An anti-microbial coating is applied to the membrane ( 213 ) adjacent the holes ( 218 ).
1. A method for making an anti-microbial filter for a micro-fluidic system, the method comprising the steps of:
providing a substrate;
forming a filter membrane of a filter material on the substrate; and
forming a plurality of holes through the filter membrane by providing a filter mask having a plurality of holes therein over the filter membrane by depositing a plurality of spacers on the filter material such that a part of each of the spacers contacts the filter material to define said plurality holes in the filter mask, depositing filter mask material partially around the spacers and on the filter material such that the part of each of the spacers that contacts the surface of the filter material prevents the filter mask material from continuously coming between the spacers and the filter material and thereby defines one of the plurality of holes in the filter mask, removing the plurality of spacers to form the plurality of holes in the filter mask, and
forming the plurality of holes in the filter membrane in registration with the plurality of holes in the filter mask; and
removing at least a portion of the substrate to expose at least some of the holes in the filter membrane;
wherein, said spacers are sub-micron particles selected from polystyrene, silica or carboxylate polystyrene.
2. The method according to claim 1 , wherein the step of forming the filter membrane further comprises the step of:
diffusing filter material into a predetermined depth of the substrate, wherein the predetermined depth of the diffusion of the filter material into the substrate corresponds to a predetermined thickness of the filter membrane.
3. The method according to claim 1 , wherein the step of forming the filter membrane further comprises the step of:
depositing the filter membrane on the substrate.
4. The method according to claim 1 , wherein the step of removing the plurality of spacers further comprises the step of:
dissolving the plurality of spacers.
5. The method according to claim 1 , wherein the step of removing the plurality of spacers further comprises the step of:
disintegrating the plurality of spacers.
6. The method according to claim 1 , wherein the step of forming the plurality of holes in the filter membrane comprises the step of:
etching the filter membrane through the holes in the filter mask.
7. The method according to claim 1 comprising the step of:
depositing an anti-microbial coating between the holes on the filter membrane.
8. The method according to claim 7 wherein the anti-microbial coating contains silver.
9. The method according to claim 6 , wherein the etching step includes reactive ion etching.