IP Library Granted Patent US 7,121,912
Granted Patent B2
US 7,121,912 · App. 10/764,765 · Granted Oct 17, 2006

Method of improving stability in OLED devices

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,121,912
App. No.
10/764,765
Granted
Oct 17, 2006
Kind
B2
Abstract

A method of treating a cathode of an OLED device having a substrate and which has a spaced anode and organic layers between the anode and cathode includes evacuating a chamber so that it has a pressure no greater than 10 −6 Torr; heating the OLED substrate in the chamber to a temperature less than 100° C.; and delivering gas, including ozone, to the evacuated chamber which includes the heated OLED substrate at a sufficient rate so that the pressure is less than 1 atmosphere, so that the life of the OLED substrate is increased and the operating voltage is decreased.

Claims (16)

1. A method of treating a cathode of an OLED device having a substrate and which has a spaced anode and organic layers between the anode and cathode, comprising:

a) evacuating a chamber so that it has a pressure no greater than 10 −6 Torr;

b) heating the OLED substrate in the chamber to a temperature less than 100° C.; and

c) delivering gas, including ozone, to the evacuated chamber which includes the heated OLED substrate to increase the pressure in the chamber to a level that is less than 1 atmosphere, so that the life of the OLED substrate is increased and the operating voltage is decreased.

2. A method of forming an OLED device, comprising:

a) providing an anode over the substrate;

b) providing a series of organic layers over the substrate; and

c) providing a cathode having at least two sublayers by forming a first cathode sublayer on the organic layers and treating the first cathode sublayer in accordance with the method according to claim 1 , and forming a second cathode sublayer on the first cathode sublayer.

3. The method according to claim 1 wherein the ozone gas concentration is between the range of 10–20% by volume of the incoming gas and the substrate temperature is below the glass transition temperature of at least one of the deposited organic materials on the OLED device.

4. The method according to claim 2 wherein the ozone gas concentration is between the range of 10–20% by volume of the incoming gas and the substrate temperature is below the glass transition temperature of at least one of the deposited organic materials on the OLED device.

5. A method of forming an OLED device, comprising:

a) providing a substrate and an anode over the substrate;

b) providing a series of organic layers over the substrate;

c) providing a cathode over the substrate;

d) performing the method according to claim 1 ; and

e) forming by an atomic layer deposition process an encapsulation layer using alternating gases, at least one of which has ozone.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 26, 2010
From: EASTMAN KODAK COMPANY
To: GLOBAL OLED TECHNOLOGY LLC
Reel/Frame 023998/0368 →