Process for forming polycrystalline silicon layer by laser crystallization
View Patent ↗A process for forming a polycrystalline silicon layer includes the following steps. Firstly, at least one seed is formed on a substrate. Then, an amorphous silicon layer is formed on the substrate and overlies the seed. Then, the amorphous silicon layer is irradiated with a laser to melt the amorphous silicon layer. Afterward, the molten amorphous silicon layer is recrystallized to form a polycrystalline silicon layer.
1. A process for forming a polycrystalline silicon layer, comprising steps of:
forming at least one seed made of amorphous silicon on a substrate;
forming an amorphous silicon layer on said substrate, overlying said amorphous silicon seed;
irradiating said amorphous silicon layer with a laser to melt said amorphous silicon layer; and
recrystallizing said molten amorphous silicon layer to form a polycrystalline silicon layer;
wherein said step of forming said at least one seed on said substrate comprises sub-steps of:
forming an intermediate covering layer on said substrate;
patterning said intermediate covering layer to define said intermediate covering layer as a specified pattern;
forming an amorphous silicon spacer beside said specified pattern; and
removing said specified pattern with said spacer remained.
2. The process according to claim 1 wherein said intermediate covering layer is made of silicon nitride.
3. The process according to claim 1 wherein said intermediate covering layer is made of metal.
4. A process for forming a polycrystalline silicon layer, comprising steps of:
defining a first region and a second region on a surface of a substrate;
forming an intermediate covering layer on said first region of said substrate;
patterning said intermediate covering layer to define said intermediate covering layer as a specified pattern;
forming an amorphous silicon spacer beside said specified pattern;
removing said specified pattern with said spacer remained to form at least one seed on said first region of said substrate;
forming an amorphous silicon layer on said first and said second regions of said substrate;
irradiating said amorphous silicon layer with a laser to melt said amorphous silicon layer; and
recrystallizing said molten amorphous silicon layer on said first region to form a polycrystalline silicon layer.
5. The process according to claim 4 wherein said substrate is a glass substrate.
6. The process according to claim 4 wherein said substrate is a plastic substrate.
7. The process according to claim 4 wherein said laser is an excimer laser.
8. The process according to claim 4 wherein said intermediate covering layer is made of silicon nitride.
9. The process according to claim 4 wherein said intermediate covering layer is made of metal.
10. The process according to claim 4 further comprising a step of recrystallizing said molten amorphous silicon layer on said second region to form a microcrystalline silicon layer.
11. A process for fabricating a polycrystalline silicon layer, comprising steps of:
providing a substrate;
forming an intermediate covering layer on said substrate;
patterning said intermediate covering layer to define said intermediate covering layer as a specified pattern;
forming an amorphous silicon spacer beside said specified pattern;
removing said specified pattern with said spacer remained to form at least one seed on said substrate;
forming an amorphous silicon layer on said substrate, overlying said seed;
irradiating said amorphous silicon layer with a laser to melt said amorphous silicon layer; and
recrystallizing said molten amorphous silicon layer to form a polycrystalline silicon layer.
12. The process according to claim 11 wherein said substrate is a glass substrate.
13. The process according to claim 11 wherein said substrate is a plastic substrate.
14. The process according to claim 11 wherein said laser is an excimer laser.
15. The process according to claim 11 wherein said intermediate covering layer is made of one of silicon nitride and metal.
16. A process for forming a polycrystalline silicon layer, comprising steps of:
defining a first region and a second region on a surface of a substrate;
forming at least one seed on said first region of said substrate;
forming an amorphous silicon layer on said first and said second regions of said substrate;
irradiating said amorphous silicon layer on said first region and said second region with a laser to melt said amorphous silicon layer; and
recrystallizing said molten amorphous silicon layer on said first region and said second region to form a polycrystalline silicon layer and a microcrystalline silicon layer, respectively.