IP Library Granted Patent US 7,475,470
Granted Patent B2
US 7,475,470 · App. 10/774,370 · Granted Jan 13, 2009

Method for manufacturing a magnetic head for perpendicular recording

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Quick Facts
Patent No.
US 7,475,470
App. No.
10/774,370
Granted
Jan 13, 2009
Kind
B2
Abstract

On the trailing side of a main pole air bearing surface of a magnetic head for perpendicular recording, the central portion is formed closer to the leading side than the corners on the trailing side, such that the main pole air bearing surface is formed in the shape of a recess with respect to the tailing side. As a result, it is possible to linearize the magnetic field distribution on the trailing side whereby the magnetic reversal is determined, and to record a bit without curving the shape of magnetic reversal.

Claims (9)

1. A method for manufacturing a single pole type magnetic write head including a main pole and an auxiliary pole, comprising the steps of:

forming an inorganic insulating layer;

forming a groove in the inorganic insulating layer;

forming a magnetic layer serving as a main pole of the write head in the groove; and

forming a recess in the magnetic layer on a trailing side of an air bearing surface thereof,

wherein an outline of the main pole as seen from the air bearing surface side has a first line segment opposed to the auxiliary pole and a second line segment opposed to the first line segment, and the second line segment has one or more points closer to the first line segment than opposite ends of the second line segment; and

wherein the recess is formed by ion milling.

2. The method for manufacturing a single pole type magnetic head according to claim 1 , wherein the recess is formed by removing a part of the magnetic layer with any one of the following methods of CMP, acid treatment, and RIE.

3. The method for manufacturing a single pole type magnetic head according to claim 1 , wherein the step of forming a groove in the inorganic insulating layer includes a step of forming a resist pattern on the inorganic insulating layer and the step of performing etching using the resist pattern as a mask.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 10, 2006
From: HITACHI, LTD.
To: HITACHI GLOBAL STORAGE TECHNOLOGIES JAPAN, LTD.
Reel/Frame 017331/0825 →