Process of making a non-corrosive GMR slider for proximity recording
View Patent ↗A method of fabrication of a slider includes forming a first ferromagnetic layer, a second ferromagnetic layer, and an antiferromagnetic layer and applying a layer of protective material to proximal ends of those layers that are proximal to the disk surface. The method further includes recessing a proximal end of a non-magnetic metal layer formed on the first ferromagnetic layer from the disk surface to form at least one recessed area. The method also includes filling the recessed area with protective material to a depth such that when the layer of protective material is worn from the ends of the first ferromagnetic layer, the second ferromagnetic layer, and the antiferromagnetic layer by burnishing of the ends by the disk surface, protective material still remains in the recessed area of the non-magnetic metal layer.
1. A method of fabrication of a slider, said slider having a magneto-resistive transducer including a stack of layers, comprising the steps of:
A) forming a first ferromagnetic layer having a proximal end proximal to an air bearing surface of the slider;
B) forming a non-magnetic metal layer on said first ferromagnetic layer, said non-magnetic metal layer having a proximal end proximal to the air bearing surface of the slider;
C) forming a second ferromagnetic layer on said non-magnetic metal layer, said second ferromagnetic layer having a proximal end proximal to the air bearing surface of the slider;
D) forming an antiferromagnetic layer on said second ferromagnetic layer, said antiferromagnetic layer having a proximal end proximal to the air bearing surface of the slider;
E) recessing said proximal end of said non-magnetic metal layer from the air bearing surface of the slider to form at least one recessed area;
F) applying a layer of protective material to said proximal ends at the air-bearing surface of the slider of said first ferromagnetic layer, said second ferromagnetic layer, and said antiferromagnetic layer; and
G) filling said at least one recessed area with protective material to a depth such that at least a portion of the protective material will remain in the recessed area when said proximal ends of said first ferromagnetic layer, said second ferromagnetic layer, and said antiferromagnetic layer are drive burnished.
2. The method of fabrication as recited in claim 1 , wherein:
said recessing step E is performed by an operation chosen from the group consisting of wet etching, dry etching, reactive ion etching, and reactive ion beam etching.
3. The method of fabrication as recited in claim 1 , wherein:
said filling step G is performed by an operation chosen from the group consisting of ion beam deposit (IBD), chemical vapor deposition (CVD), physical vapor deposition (PVD) and sputtering deposition.
4. The method of fabrication as recited in claim 1 , wherein:
said protective material which is used to fill said recessed area is chosen from a group consisting of Diamond-Like Carbon, silicon and silicon nitride.
5. The method of fabrication as recited in claim 1 , wherein:
said layer of protective material and said protective material which is used to fill said recessed area is the same, and filling step G and said applying step F are performed in the same process.