Non-volatile semiconductor memory device
View Patent ↗The present invention is intended to realize executing high-speed program and erasure by using a NAND type memory cell unit that suits high degree of integration and to realize providing a highly reliable non-volatile semiconductor memory device. A memory cell is made up of a cell transistor (Tij) that is formed on the semiconductor substrate and a variable resistive element (Rij) that is connected between a source and drain terminals of the cell transistor (Tij) and the resistance value of that varies depending on applying a voltage and that is formed of the oxide having a perovskite structure that contains manganese. By connecting a plurality of the memory cells in series, there is formed a memory cell connected-in-series part. Then a memory cell block is prepared by providing a selection transistor (Si) to at least one end of the memory cell connected-in-series part. By disposing more than one such memory cell block, there is constructed a memory cell array.
1. A non-volatile semiconductor memory device, comprising
a memory cell array which includes a plurality of memory cells disposed in array, wherein the memory cell includes a transistor that is formed on a semiconductor substrate, and a variable resistive element that is connected between a source and drain terminals of the transistor and the resistance value of that varies by applying a voltage.
2. The non-volatile semiconductor memory device according to claim 1 , wherein
the variable resistive element is formed of the oxide having a perovskite-type structure that contains manganese.
3. The non-volatile semiconductor memory device according to claim 1 , wherein
the memory cell array is constructed in the way that a plurality of memory cell blocks each including a memory cell connected-in-series part wherein a plurality of the memory cells are connected in series are disposed.
4. The non-volatile semiconductor memory device according to claim 3 , wherein
the memory cell block includes, on at least one end of the memory cell connected-in-series part, a selection transistor.
5. The non-volatile semiconductor memory device according to claim 3 , wherein
the ON-state resistance of the transistor composing the memory cell is lower than a resistance value that falls within a range of change in the 32 resistance value of the variable resistive element that varies in correspondence with the status of data's being kept stored.
6. A driving method for a non-volatile semiconductor memory device, the non-volatile semiconductor memory device including a memory cell array; and
the memory cell array being constructed in the way that there are disposed a plurality of memory cell blocks each of that includes a memory cell connected-in-series part wherein a plurality of memory cells are connected in series, each memory cell including a transistor that is formed on a semiconductor substrate, and a variable resistive element that is connected between a source and drain terminals of said transistor and the resistance value of that varies by applying a voltage,
comprising a first step of, at the time of reading of data, with respect to at least the memory cell block that has been selected, making non-conductive the transistor of any one of the memory cells in the memory cell connected-in-series part to thereby select this memory cell, then applying a prescribed level of reading voltage to both ends of the memory cell connected-in-series part, and thereby executing reading of data with respect to the memory cell that has been selected; and
a second step of, at the time of programming of data, with respect to at least the memory cell block that has been selected, making non-conductive the transistor of any one of the memory cells in the memory cell-connected-in-series part to thereby select this memory cell, then applying a prescribed level of programming voltage to both ends of the memory cell connected-in-series part, and thereby executing programming of data with respect to the memory cell that has been selected.
7. The driving method for a non-volatile semiconductor memory device according to claim 6 , further comprising:
a third step of, at the time of erasure of data, with respect to at least the memory cell block that has been selected, making non-conductive the transistor of any one of the memory cells in the memory cell connected-in-series part to thereby select this memory cell, then applying a prescribed level of erasure voltage to both ends of the memory cell connected-in-series part, and thereby executing erasure of data with respect to the memory cell that has been selected.