Structure and plating method of thin film magnetic head and magnetic storage apparatus
View Patent ↗A material for magnetic pole for attaining a writing head generating an intense recording magnetic field, and a structure and a manufacturing method therefor. The thin film magnetic head includes a magnetic pole layer having a plated magnetic layer containing Co, Ni and Fe formed on a plated underlayer of a sputtered magnetic layer containing Co, Ni and Fe. The CoNiFe magnetic layer having a composition: 40 wt %≦Co≦70 wt %, 10 wt %≦Ni≦25 wt % and 10 wt %≦Fe≦30 wt % and a peak intensity ratio in the X-ray diffraction of I(200)/I(111)≧0.5 and I(110)/I(111)≧1 (defining peak intensities for the face-centered cubic fcc (111) face, fcc (200) face and the body-centered cubic bcc (119) face as: I(111), I(200), I(110)).
1. A method of manufacturing a thin film magnetic head having a lower magnetic pole, an upper magnetic pole, and a gap layer formed in-between the magnetic poles, comprising the steps of:
forming on the gap layer a first magnetic layer containing Co, Ni and Fe by a sputtering method, and
forming a second magnetic layer containing Co, Ni, Fe, and saccharine sodium on said first magnetic layer, which is as an underlayer, using an electroplating method as an upper magnetic pole layer,
wherein said first magnetic layer is comprised of: 40 wt %≦Co≦70 wt %, 10 wt %≦Ni≦25 wt %, and 10 wt %≦Fe≦30 wt %,
further wherein said second magnetic layer is comprised of: 40 wt %≦Co≦70 wt %, 10 wt %≦Ni≦25 wt %, and 10 wt %≦Fe≦30 wt % and saccharine sodium,
said first magnetic layer mainly comprises a body-centered cubic system,
further wherein said second magnetic layer has a peak intensity ratio of I(200)/I(111)≧0.5 and I(110)/I(111)≧1,
said second magnetic layer has a constitutional ratio of the face-centered cubic system and the body-centered cubic system of: 53%≦body-centered cubic system≦80% and 20%≦face-centered cubic system≦47%, and
said face-centered cubic system+body-centered cubic system=100%.
2. The manufacturing method of claim 1 , wherein said second magnetic layer is formed from a plating bath containing 0.5 to 2 g/l of saccharine sodium.
3. The manufacturing method of claim 2 , wherein said second magnetic layer is formed by conducting electroplating at: a plating bath temperature of from 25° C. to 35° C.; a current density of from 3 to 12 mA/cm 2 ; and a pH value of from 3.2 to 4.0.
4. The manufacturing method of claim 1 , wherein said first magnetic layer has a saturation magnetic flux density greater than the saturation magnetic flux density of said second magnetic layer.