Insulating-film forming material and insulating film using the same
View Patent ↗An insulating-film forming material comprising a resin (A) that has a structure represented by formula (I): wherein Y 1 , Y 2 , Ar 1 and Ar 2 are the same or different; each of Y 1 , Y 2 , Ar 1 and Ar 2 represents an aromatic ring-containing divalent organic group; at least one of Y 1 and Y 2 is a divalent aromatic polycyclic group having a specific structure; m and n each indicates a molar percentage of the repeating units; and m falls between 0 and 100 with (m+n)=100.
1. An insulating-film forming material comprising a resin (A) that has a structure represented by general formula (I):
wherein Y 1 , Y 2 , Ar 1 and Ar 2 are the same or different; each of Y 1 , Y 2 , Ar 1 and Ar 2 represents an aromatic ring-containing divalent organic group; at least one of Y 1 and Y 2 is selected from the group consisting of formulae (Y-1), (Y-2), (Y-3) and (Y-4); m and n each indicates a molar percentage of the repeating units; and m falls between 0 and 100 with (m+n)=100;
in formulae (Y-1) and (Y-2), Ral 1 to Ral 4 each represents a monovalent hydrocarbon group not containing an aromatic ring; Rar 1 and Rar 2 each represents an aromatic ring-containing monovalent hydrocarbon group; Ral 1 to Ral 4 , Rar 1 and Rar 2 may bond to each other to form a ring; and p, q, r, s, p′ and q′ each indicates an integer of from 0 to 3; and
in formulae (Y-3) and (Y-4), Ral 1 and Ral 2 each represents a monovalent hydrocarbon group not containing an aromatic ring; Rar 1 and Rar 2 each represents an aromatic ring-containing monovalent hydrocarbon group; Ral 1 , Ral 2 , Rar 1 and Rar 2 may bond to each other to form a ring; t and u each indicates an integer of from 1 to 4; and v and w each indicates an integer of from 0 to 4.
2. The insulating-film forming material as claimed in claim 1 , wherein each of Y 1 and Y 2 in formula (I) is selected from the group consisting of formulae (Y-1) and (Y-2).
3. The insulating-film forming material as claimed in claim 1 , wherein each of Y 1 and Y 2 in formula (I) is selected from the group consisting of (Y-3) and (Y-4), and each of Ar 1 and Ar 2 is selected from the group consisting of the following groups:
4. An insulating film obtained by using an insulating-film forming material as claimed in claim 1 .
5. A porous insulating-film forming material comprising: a polymer that has a structure represented by general formula (I); and at least one of a compound (B-1) and hollow particles (B-2), the compound (B-1) having a boiling or decomposition point of 250° C. to 450° C.,
wherein Y 1 , Y 2 , Ar 1 and Ar 2 are the same or different; each of Y l , Y 2 , Ar 1 and Ar 2 represents an aromatic ring-containing divalent organic group; at least one of Y 1 and Y 2 is selected from the group consisting of formulae (Y-1), (Y-2), (Y-3) and (Y-4); m and n each indicates a molar percentage of the repeating units; and m falls between 0 and 100 with (m+n)=100;
in formulae (Y-1) and (Y-2), Ral 1 to Ral 4 each represents a monovalent hydrocarbon group not containing an aromatic ring; Rar 1 and Rar 2 each represents an aromatic ring-containing monovalent hydrocarbon group; Ral 1 to Ral 4 , Rar 1 and Rar 2 may bond to each other to form a ring; and p, q, r, s, p′ and q′ each indicates an integer of from 0 to 3; and
in formulae (Y-3) and (Y-4), Ral 1 and Ral 2 each represents a monovalent hydrocarbon group not containing an aromatic ring; Rar 1 and Rar 2 each represents an aromatic ring-containing monovalent hydrocarbon group; Ral 1 , Ral 2 , Rar 1 and Rar 2 may bond to each other to form a ring; t and u each indicates an integer of from 1 to 4; and v and w each indicates an integer of from 0 to 4.
6. The porous insulating-film forming material as claimed in claim 5 , wherein each of Y 1 and Y 2 in formulae (I) is selected from the group consisting of formulae (Y-1) and (Y-2).
7. The porous insulating-film forming material as claimed in claim 5 , wherein each of Y 1 and Y 2 in formula (I) is selected from the group consisting of formulae (Y-3) and (Y-4).
8. A porous insulating-film forming material comprising a resin (A′) that has a structure represented by formula (I′):
wherein Y 1 , Y 2 , Ar 1 and Ar 2 are the same or different;
each represents an aromatic ring-containing divalent organic group;
at least one of Y 1 , Y 2 , Ar 1 and Ar 2 includes at least one of (a) a structure that decomposes under heat at 250° C. to 450° C. to generate gas; (b) a structure that decomposes through UV irradiation to generate gas; and (c) a structure that decomposes through electron beam irradiation to generate gas;
m and n each indicates a molar percentage of the repeating units; and
m falls between 0 and 100 with (m+n)=100.
9. A porous insulating film obtained by using an insulating-film forming material as claimed in claim 5 .
10. A porous insulating film obtained by using an insulating-film forming material as claimed in claim 8 .