Exposure device
View Patent ↗In an exposure device, a beam emitted from a light emitting point of a laser diode (LD) is limited by a slit. The slit limits a light beam in a direction orthogonal to an active layer of the LD. The exposure device has a moving mechanism which moves a plate in which the slit is provided, in a direction orthogonal to the plate. Object points are different at a beam and at flare light. Therefore, the plate is provided in a vicinity of the light emitting point in order to limit the light beam in the vicinity of the light emitting point, i.e., at a place near a point where a beam spot is smallest, and to be able to effectively block only the flare light.
1. An exposure device using a GaN blue semiconductor laser as a light source, comprising:
a first limiting device, which limits a light beam which passes through, is provided between an active layer of the semiconductor laser and a coupling lens which is nearest to the active layer, and the first limiting device comprising a limiting direction being a direction orthogonal to the active layer of the semiconductor laser.
2. The exposure device of claim 1 , wherein the first limiting device is relatively movable in the limiting direction to the light source.
3. The exposure device of claim 1 , further comprising a second limiting device, which limits a light beam which passes through, is provided after the coupling lens, and the second limiting device comprising a limiting direction being a direction along the active layer of a laser crystal.
4. The exposure device of claim 1 , wherein, given that a width of an opening of the first limiting device in the limiting direction is D, a distance from a light emitting surface of the active layer to the first limiting device is L, and a spread angle of a beam from the light emitting surface is α, the exposure device is structured so as to satisfy:
D/{ 2 L ∘ tan(α/2)}≦2.0.
5. The exposure device of claim 1 , wherein the first limiting device includes a slit formed in a plate.
6. The exposure device of claim 1 , wherein the first limiting device includes a coupling lens whose numerical aperture is set under predetermined conditions.
7. The exposure device of claim 3 , wherein the second limiting device is movable in the limiting direction of the second limiting device.
8. The exposure device of claim 3 , wherein the second limiting device includes a slit formed in a plate.
9. The exposure device of claim 5 , wherein the first limiting device which includes the slit is movable by a moving mechanism having a driving device which combines a stepping motor and a rack-and-pinion gear.
10. The exposure device of claim 8 , wherein the second limiting device which includes the slit is movable by a moving mechanism having a driving device which combines a stepping motor and a rack-and-pinion gear.
11. An exposure device using a GaN blue semiconductor laser as a light source, wherein, given that a numerical aperture of a coupling lens nearest to a light emitting surface of an active layer of the blue semiconductor laser is NA and a spread angle of a beam from the light emitting surface is α, the exposure device is structured so as to satisfy:
NA ∘ tan(α/2)≦2.0.
12. An exposure device which uses a GaN blue semiconductor laser as a light source, and which forms an image by irradiated light irradiated from the GaN blue semiconductor laser onto a photosensitive material using a silver halide, and which carries out gradation expression of the image by controlling a driving current of the GaN blue semiconductor laser and modulating an emission intensity of the irradiated light, wherein
a limiting device, which limits a light beam which passes through, is provided between a light emitting point of the GaN blue semiconductor laser and a coupling lens which is nearest to the light emitting point,
a limiting direction of the limiting device is a direction orthogonal to an active layer of the GaN blue semiconductor laser, and
given that a width of an opening of the limiting device in the limiting direction is D, a distance from a light emitting point of the active layer to the limiting device is L, and a spread angle of a beam from the light emitting point is α, the exposure device is structured so as to satisfy:
D/{ 2 L ∘ tan(α/2)}≦1.8.
13. The exposure device of claim 12 , wherein a predetermined driving current is always continuously applied to the GaN blue semiconductor laser, and even in a state in which there is no image signal, the GaN blue semiconductor laser emits light in an LED region.
14. The exposure device of claim 12 , wherein the limiting device includes a slit formed in a plate.
15. The exposure device of claim 14 , wherein the limiting device which includes the slit is movable by a moving mechanism having a driving device which combines a stepping motor and a rack-and-pinion gear.
16. An exposure device which uses a GaN blue semiconductor laser as a light source, and which forms an image by irradiated light irradiated from the GaN blue semiconductor laser onto a photosensitive material using a silver halide, and which carries out gradation expression of the image by controlling a driving current of the GaN blue semiconductor laser and modulating an emission intensity of the irradiated light, wherein
given that a numerical aperture of a coupling lens nearest to a light emitting point of an active layer of the GaN blue semiconductor laser is NA and a spread angle of a beam from the light emitting point is α, the exposure device is structured so as to satisfy:
NA ∘ tan(α/2)≦1.8.
17. The exposure device of claim 16 , wherein a predetermined driving current is always continuously applied to the GaN blue semiconductor laser, and even in a state in which there is no image signal, the GaN blue semiconductor laser emits light in an LED region.