Liquid crystal display device and method of fabricating the same wherein having particular reflective electrode
View Patent ↗A liquid crystal display device includes first and second substrates facing and spaced apart from each other, a gate line and a data line on an inner surface of the first substrate, a thin film transistor connected to the gate line and the data line, a passivation layer on the thin film transistor, a pixel electrode on the passivation layer, an organic insulating film on the pixel electrode corresponding to the data line, a reflective electrode on the organic insulating film and connected to the pixel electrode, a black matrix on an inner surface of the second substrate corresponding to the thin film transistor, a common electrode over the black matrix, and a liquid crystal layer between the reflective electrode and the common electrode.
1. A liquid crystal display device, comprising:
first and second substrates facing and spaced apart from each other;
a gate line and a data line on an inner surface of the first substrate;
a thin film transistor connected to the gate line and the data line;
a passivation layer on the thin film transistor;
a pixel electrode on the passivation layer;
an organic insulating film on the pixel electrode corresponding to the data line;
a reflective electrode on the organic insulating film and connected to the pixel electrode;
a black matrix on an inner surface of the second substrate corresponding to the thin film transistor;
a common electrode over the black matrix; and
a liquid crystal layer between the reflective electrode and the common electrode.
2. The device according to claim 1 , wherein a width of the reflective electrode is greater than a thickness of the data line, and the reflective electrode covers the data line.
3. The device according to claim 1 , wherein the organic insulating film and the reflective electrode cover the gate line.
4. The device according to claim 1 , wherein a first thickness of the liquid crystal layer corresponding to the pixel electrode is greater than a second thickness of the liquid crystal layer corresponding to the reflective electrode.
5. The device according to claim 4 , wherein the first thickness is substantially twice as much as the second thickness.
6. The device according to claim 1 , wherein the organic insulating layer is formed of the same material as the passivation layer.
7. The device according to claim 1 , wherein the pixel electrode is formed of one of indium-tin-oxide (ITO) and indium-zinc-oxide (IZO).
8. The device according to claim 1 , further comprising a backlight unit under the first substrate.
9. The device according to claim 8 , further comprising a first polarizing plate on an outer surface of the first substrate and a second polarizing plate on an outer surface of the second substrate.
10. The device according to claim 9 , further comprising a first optical film between the first substrate and the first polarizing plate and a second optical film between the second substrate and the second polarizing plate.
11. The device according to claim 1 , further comprising a color filter layer between the black matrix and the common electrode.
12. The device according to claim 11 , further comprising an overcoat layer between the color filter layer and the common electrode.
13. The device according to claim 1 , further comprising a color filter layer on the pixel electrode and the reflective electrode.
14. The device according to claim 13 , wherein a first thickness of the color filter layer corresponding to the pixel electrode is greater than a second thickness of the color filter layer corresponding to the reflective electrode.
15. The device according to claim 1 , wherein the pixel electrode overlaps the data line.
16. A liquid crystal display device, comprising:
first and second substrates facing and spaced apart from each other;
a gate line and a data line on an inner surface of the first substrate;
a thin film transistor connected to the gate line and the data line;
a passivation layer on the thin film transistor;
a pixel electrode on the passivation layer;
an organic insulating film on the pixel electrode corresponding to the data line and the thin film transistor;
a reflective electrode on the organic insulating film and connected to the pixel electrode;
a common electrode over an inner surface of the second substrate; and
a liquid crystal layer between the reflective electrode and the common electrode.
17. The device according to claim 16 , wherein a width of the reflective electrode is greater than a thickness of the data line and the reflective electrode covers the data line.
18. The device according to claim 16 , wherein the organic insulating film and the reflective electrode cover the gate line.
19. The device according to claim 16 , wherein a first thickness of the liquid crystal layer corresponding to the pixel electrode is greater than a second thickness of the liquid crystal layer corresponding to the reflective electrode.
20. The device according to claim 19 , wherein the first thickness is substantially twice as much as the second thickness.
21. The device according to claim 16 , wherein the organic insulating layer is formed of the same material as the passivation layer.
22. The device according to claim 16 , wherein the pixel electrode is formed of one of indium-tin-oxide (ITO) and indium-zinc-oxide (IZO).
23. The device according to claim 16 , further comprising a backlight unit under the first substrate.
24. The device according to claim 23 , further comprising a first polarizing plate on an outer surface of the first substrate and a second polarizing plate on an outer surface of the second substrate.
25. The device according to claim 24 , further comprising a first optical film between the first substrate and the first polarizing plate and a second optical film between the second substrate and the second polarizing plate.
26. The device according to claim 16 , further comprising a color filter layer between the second substrate and the common electrode.
27. The device according to claim 26 , further comprising an overcoat layer between the color filter layer and the common electrode.
28. The device according to claim 16 , further comprising a color filter layer on the pixel electrode and the reflective electrode.
29. The device according to claim 28 , wherein a first thickness of the color filter layer corresponding to the pixel electrode is greater than a second thickness of the color filter layer corresponding to the reflective electrode.
30. The device according to claim 16 , wherein the pixel electrode overlaps the data line.
31. A method of fabricating a liquid crystal display device, comprising:
forming a gate line and a data line on an inner surface of a first substrate;
forming a thin film transistor on the first substrate connected to the gate line and the data line;
forming a passivation layer on the thin film transistor;
forming a pixel electrode on the passivation layer;
forming an organic insulating film on the pixel electrode corresponding to the data line;
forming a reflective electrode on the organic insulating film and connected to the pixel electrode;
forming a black matrix on an inner surface of a second substrate corresponding to the thin film transistor;
forming a common electrode over the black matrix;
providing the second substrate opposite to the first substrate; and
forming a liquid crystal layer between the reflective electrode and the common electrode.
32. The method according to claim 31 , wherein a width of the reflective electrode is greater than a thickness of the data line, and the reflective electrode covers the data line.
33. The method according to claim 31 , wherein the organic insulating film and the reflective electrode cover the gate line.
34. The method according to claim 31 , wherein the organic insulating layer is formed of the same material as the passivation layer.
35. The method according to claim 31 , further comprising forming a color filter layer on the pixel electrode and the reflective electrode.
36. The method according to claim 35 , wherein a first thickness of the color filter layer corresponding to the pixel electrode is greater than a second thickness of the color filter layer corresponding to the reflective electrode.
37. The method according to claim 31 , wherein the pixel electrode overlaps the data line.
38. A method of fabricating a liquid crystal display device, comprising:
forming a gate line and a data line on an inner surface of a first substrate;
forming a thin film transistor on the first substrate connected to the gate line and the data line;
forming a passivation layer on the thin film transistor;
forming a pixel electrode on the passivation layer;
forming an organic insulating film on the pixel electrode corresponding to the data line and the thin film transistor;
forming a reflective electrode on the organic insulating film and connected to the pixel electrode;
forming a common electrode over an inner surface of a second substrate;
providing the second substrate opposite to the first substrate; and
forming a liquid crystal layer between the reflective electrode and the common electrode.
39. The method according to claim 38 , wherein a width of the reflective electrode is greater than a thickness of the data line and the reflective electrode covers the data line.
40. The method according to claim 38 , wherein the organic insulating film and the reflective electrode cover the gate line.
41. The method according to claim 38 , wherein the organic insulating layer is formed of the same material as the passivation layer.
42. The method according to claim 38 , further comprising forming a color filter layer on the pixel electrode and the reflective electrode.
43. The method according to claim 42 , wherein a first thickness of the color filter layer corresponding to the pixel electrode is greater than a second thickness of the color filter layer corresponding to the reflective electrode.
44. The method according to claim 38 , wherein the pixel electrode overlaps the data line.