Work piece with a hard film of AlCr-containing material, and process for its production
View Patent ↗A work piece or structural component is coated with a system of film layers at least one of which is composed of (Al y Cr 1-y ) X, where X=N, C, B, CN, BN, CBN, NO, CO, BO, CNO, BNO or CBNO and 0.2≦y<0.7, with the composition within said film being either essentially constant or varying over the thickness of the film continually or in steps, as well as a process for producing it.
1. Work piece coated with a system of film layers comprising at least one film composed of (Al y Cr 1-y ) X, where X=N, C, B, CN, BN, CBN, NO, CO, BO, CNO, BNO or CBNO and 0.66≦y≦0.695, with the composition within said (Al y Cr 1-y ) X film being either essentially constant or varying over the thickness of the (Al y Cr 1-y ) X film continually or in steps, said (Al y Cr 1-y ) X film having a cubic crystal structure and said work piece constituting one of the following tools: a milling tool, a hob, (spherical-head) ball nose mill, planar or profiling cutter, a clearing tool, reamer, (indexable tip) insert for turning and milling, a die or an injection mold.
2. Tool as in claim 1 , wherein the tool is a forming tool of an upper die, a bottom swage, a drawing die, an ejector core or a thread former.
3. Tool as in claim 1 , wherein the tool is an injection-molding tool for producing a molded plastic part or a data storage medium.
4. Tool as in claim 1 , wherein the tool features a CBN or Cermet base unit or that the tool is a CBN or Cermet (indexable tip) insert.
5. Process comprising the steps of machining a material with a tool recited in claim 1 , wherein said machining using said tool is performed without the addition of lubricants or cooling agents.
6. Process as in claim 5 , wherein the tool is a hard-metal or HSS hob (cutter) and the cutting speed is 60 to 450 m/min.
7. Process as in claim 5 , wherein the tool is an end-milling, (spherical-head) ball-nose-mill or a roughing cutter.
8. Work piece coated with a system of film layers comprising at least one film composed of (Al y Cr 1-y ) X, where X=N, C, B, CN, BN, CBN, NO, CO, BO, CNO, BNO or CBNO and 0.66≦y≦0.695, with the composition within said (Al y Cr 1-y ) X film being either essentially constant or varying over the thickness of the (Al y Cr 1-y ) X film continually or in steps, said (Al y Cr 1-y ) X film having a cubic crystal structure and said work piece constituting a machine component.
9. Machine component as in claim 8 , wherein said component is a sealing washer, a gear, a piston, a part of a valve drive or a needle for an injection nozzle, or that it is toothed.
10. Work piece as in one of the claims 1 - 4 , wherein a rate of wear of the (Al y Cr 1-y ) X film is less than or equal to 1.5 m 3 m −1 N −1 10 −15 .
11. Work piece as in one of claims 1 - 4 , wherein a Vickers pyramid hardness of the (Al y Cr 1-y ) X film is 2300 to 3100.
12. Work piece as in one of claims 1 - 4 , wherein a layer structure of the (Al y Cr 1-y ) X film is microcrystalline with an average grain size of 20 to 120 nm.
13. Work piece as in one of claims 1 - 4 , wherein a bonding layer is applied between the work piece and the (Al y Cr 1-y ) X film.
14. Work piece as in claim 13 , wherein said bonding layer encompasses at least one of the metals of group IV, V or subgroup VI, or aluminum.
15. Work piece as in claim 13 , wherein said bonding layer includes at least one nitride, carbide or carbonitride of one or several metals of subgroup IV, V or VI.
16. Work piece as in claim 13 , wherein at least one (Al y Cr 1-y ) X film is additionally coated with a slip layer.
17. Work piece as in claim 16 , wherein said slip layer encompasses a carbide of at least one metal with dispersed carbon, MeC/C wherein Me is selected from among group IVb, Vb and VIb metals and silicon, a diamond-like carbon layer, a Si— or metallic diamond-like carbon layer, a MoS x , a WS x or a titanium-containing MoS x or MoW x layer.
18. PVD process for depositing at least one (Al y Cr 1-y ) X film on a work piece, where X=N, C, B, CN, BN, CBN, NO, Ca, BO, CNO, BNO, CBNO and 0.66≦y≦0.695, comprising the steps of installing at least one work piece in a vacuum coating system with at least one Al z Cr 1-z target, where 0.25≦z<0.75, operating said system at a pressure of 0.5 to 8 Pa with the addition of a nitrogen-, carbon- boron- or oxygen-containing reactive gas and applying on the work piece of a substrate voltage of between −3 and −150V, as an arc or sputtering source, wherein the constituent composition within the said at least one (Al y Cr 1-y ) X film is either essentially constant or varies either continuously or in steps over the thickness of the film, said at least one (Al y Cr 1-y ) X film having a cubic crystal structure, and said work piece being selected from among the work pieces recited in either of claims 1 or 8 .
19. PVD process as in claim 18 , wherein X=N and the reactive gas is nitrogen or oxygen.
20. PVD process as in claim 18 or 19 , wherein the substrate voltage is pulsed.
21. PVD process as in claim 18 or 19 , wherein the Al z Cr 1-z target is a powder-metallurgically produced target.
22. PVD process as in claim 21 , wherein the target is produced by cold-pressing starting material in powder form with repeated subsequent reshaping, at temperatures under 660° C., densification by fluxing and cold fusion, arid transformation into its final state with a theoretical density at about 96 to 100%.