IP Library Granted Patent US 7,306,895
Granted Patent B2
US 7,306,895 · App. 10/828,472 · Granted Dec 11, 2007

Pattern forming method, image forming method, fine particle adsorption pattern forming method, conductive pattern forming method, pattern forming material and planographic printing plate

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Quick Facts
Patent No.
US 7,306,895
App. No.
10/828,472
Granted
Dec 11, 2007
Kind
B2
Abstract

The invention provides a pattern forming method including providing a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support, and forming a pattern including a preparation zone and a non-preparation zone of a graft polymer by preparing the graft polymer on the surface of the polymerization initiation layer using graft polymerization, by contacting a compound having a polymerizable group on the polymerization initiation layer and supplying energy imagewise; an image forming method which applies the pattern forming method; a pattern forming material; and a planographic printing plate. A fine particle adsorption pattern forming method and a conductive pattern forming method are also provided.

Claims (37)

1. A pattern forming method comprising:

providing a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support; and

forming a pattern comprising a preparation zone and a non-preparation zone of a graft polymer by preparing the graft polymer on the surface of the polymerization initiation layer using graft polymerization, by contacting a compound having a polymerizable group on the polymerization initiation layer and supplying energy imagewise.

2. An image forming method comprising:

providing a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support;

forming a pattern comprising a preparation zone and a non-preparation zone of a graft polymer by preparing the graft polymer on the surface of the polymerization initiation layer using graft polymerization, by contacting a compound having a polymerizable group on the polymerization initiation layer and supplying energy imagewise; and adhering a colorant on the preparation zone or the non-preparation zone of the graft polymer.

3. A fine particle adsorption pattern forming method comprising:

forming a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support;

preparing a graft polymer having a polar group in a pattern shape on the surface of the polymerization initiation layer; and

adsorbing fine particles on the graft polymer.

4. A fine particle adsorption pattern forming method comprising:

forming a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support;

forming a pattern comprising a preparation zone and a non-preparation zone of a graft polymer by preparing the graft polymer on the surface of the polymerization initiation layer using graft polymerization, by contacting a compound having a polymerizable group and a polar group on the polymerization initiation layer and supplying energy imagewise; and

adsorbing fine particles on the preparation zone of the graft polymer.

5. A fine particle adsorption pattern forming method comprising:

forming a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support;

forming a pattern comprising a hydrophilic zone and a hydrophobic zone on the surface of the polymerization initiation layer, by providing a polymer compound layer comprising a polymer compound which is directly and chemically bonded with the polymerization initiation layer and has a functional group whose hydrophilicity or hydrophobicity is changed by heat, acid or radiation and applying heat, acid or radiation imagewise to the polymer compound layer; and

adsorbing fine particles on the hydrophilic zone or the hydrophobic zone.

6. A conductive pattern forming method comprising:

forming a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support;

preparing a graft polymer having a polar group in a pattern shape on the surface of the polymerization initiation layer; and

adsorbing a conductive material on the graft polymer.

7. A conductive pattern forming method according to claim 6 , wherein the conductive material is further heated at a temperature in a range of 50 to 500° C. after the conductive material is adsorbed.

8. A conductive pattern forming method comprising:

forming a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support;

forming a pattern comprising a preparation zone and a non-preparation zone of a graft polymer by preparing the graft polymer on the surface of the polymerization initiation layer using graft polymerization, by contacting a compound having a polymerizable group and a polar group on the polymerization initiation layer and supplying energy imagewise; and

adsorbing a conductive material on the preparation zone of the graft polymer.

9. A conductive pattern forming method comprising:

forming a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support;

forming a pattern comprising a hydrophilic zone and a hydrophobic zone on the surface of the polymerization initiation layer, by providing a polymer compound layer comprising a polymer compound which is directly and chemically bonded with the polymerization initiation layer and has a functional group whose hydrophilicity or hydrophobicity is changed by heat, acid or radiation and applying heat, acid or radiation imagewise to the polymer compound layer; and

adsorbing a conductive material on the hydrophilic zone or the hydrophobic zone.

10. A pattern forming method comprising:

providing a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support; and

forming a pattern comprising a preparation zone anda non-preparation zone of a graft polymer by preparing the graft polymer on the surface of the polymerization initiation layer using graft polymerization, by contacting a compound having a polymerizable group on the polymerization initiation layer and supplying energy having a wavelength of 250 nm to 800 nm imagewise.

11. A pattern forming method comprising:

providing a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having ketone groups having polymerization initiation ability and cross-linking groups at side chains, on a support; and

forming a pattern comprising a preparation zone and a non-preparation zone of a graft polymer by preparing the graft polymer on the surface of the polymerization initiation layer using graft polymerization, by contacting a compound having a polymerizable group on the polymerization initiation layer and supplying energy imagewise.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 21, 2004
From: KANO, TAKEYOSHI; KAWAMURA, KOICHI
To: FUJI PHOTO FILM CO., LTD.
Reel/Frame 015252/0997 →