Donor film for flat panel display and method of fabricating OLED using the same

1. A donor film for a flat panel display, comprising:

a base film;

a Light-To-Heat Conversion layer disposed on the base film;

a transfer layer disposed on the Light-To-Heat Conversion layer; and

a buffer layer interposed between the Light-To-Heat Conversion layer and the transfer layer,

wherein the buffer layer includes a silicone polymer whose glass transition temperature (Tg) is lower than 25° C.

2. The donor film according to claim 1 , wherein the buffer layer is formed as a liquid silicone polymer is formed on the Light-To-Heat Conversion layer and then the formed liquid silicone polymer is cured by one process selected from a group of UV curing, room temperature curing, low temperature curing and catalytic curing.

3. The donor film according to claim 1 , wherein the buffer layer is less than 20 μm thick.

4. The donor film according to claim 3 , wherein the buffer layer is less than 5 μm thick.

5. The donor film according to claim 1 , the transfer layer includes at least one layer selected from a group of an emitting organic layer, a hole injecting organic layer, a hole transporting organic layer, an electron transporting organic layer and an electron injecting organic layer.

6. The donor film according to claim 5 , the transfer layer is an emitting organic layer.

7. The donor film according to claim 5 , wherein each of the organic layers includes a small molecular material.

8. The donor film according to claim 1 , further comprising an interlayer interposed between the Light-To-Heat Conversion layer and the buffer layer.

9. A method for fabricating an Organic Light Emitting Device, comprising:

forming an acceptor substrate with a pixel electrode;

arranging a donor film over the acceptor substrate, wherein the donor film includes a Light-To-Heat Conversion layer, a buffer layer and a transfer layer on a base film; and

irradiating a predetermined area of the base film with a laser beam to transfer,

wherein the buffer layer includes a silicone polymer whose glass transition temperature (T g ) is lower than 25° C.

10. The method according to claim 9 , wherein the transfer layer includes at least one layer selected from a group of an emitting organic layer, a hole injecting organic layer, a hole transporting organic layer, an electron transporting organic layer and an electron injecting organic layer.

11. A method for fabricating a donor film, comprising;

forming a light-to-heat-conversion (LTHC) layer on a base film;

forming a buffer layer on the LTHC layer; and

forming a transfer layer on the LTHC layer,

wherein the buffer layer includes a silicone polymer whose glass transition temperature (T g ) is lower than 25° C.

12. The method according to claim 11 , wherein the LTHC layer includes a metal layer or an organic polymer layer, and

wherein the metal layer is formed by vacuum evaporation, electron beam deposition or sputtering and the organic layer is formed by a roll coating method, a gravure coating method, an extrusion coating method, a spin coating method, and a knife coating method.

13. The method according to claim 11 , further comprising:

forming an interlayer between the LTHC and the buffer layer.