Reflection-type liquid crystal display and method for manufacturing the same
View Patent ↗A reflection-type liquid crystal display according to the invention includes two glass substrates, a transparent electrode provided on one glass substrate, an insulator film which is provided on another glass substrate and on which an uneven structure is formed, a reflecting electrode provided on the insulator film, and a liquid crystal layer sandwiched between a side of the transparent electrode and a side of the reflecting electrode. The insulator film includes a first insulating layer in which a large number of depressions isolated as surrounded by protrusions are irregularly arranged and a second insulating layer covering the insulating layer entirely. The protrusions are all connected in a network, so that if some of these protrusions have weaker adherence with an underlying layer, they can be supported by the surrounding protrusions.
1. A method for manufacturing a reflection-type liquid crystal display comprising:
forming a first insulating layer of an organic or inorganic insulating material having photosensitivity;
forming an uneven-element pattern in said first insulating layer by photo-exposure, said uneven-element pattern comprising stripe-shaped protrusions arranged irregularly and connected in a network;
etch-developing said first insulating layer;
melting by heat treatment said first insulating layer thus etch-developed, to thereby smooth said uneven structure; and
forming a second insulating layer on said first insulating layer thus melted.
2. The method according to claim 1 , wherein said second insulating layer comprises an organic or inorganic insulating material having photosensitivity.
3. The method according to claim 1 , wherein said second insulating layer is formed on said first insulating layer and wherein the first and second insulating layers are of different thickness.
4. A method for manufacturing a reflection-type liquid crystal display comprising:
forming a first insulating layer of an organic or inorganic insulating material having photosensitivity;
forming an uneven-element pattern in said first insulating layer by photo-exposure, said uneven-element pattern comprising stripe-shaped protrusions arranged irregularly and connected in a network;
etch-developing said first insulating layer;
melting by use of chemicals said first insulating layer thus etch-developed, to thereby smooth said uneven structure; and
forming a second insulating layer on said first insulating layer thus melted.
5. The method according to claim 4 , wherein said second insulating layer comprises an organic or inorganic insulating material having photosensitivity.