Device and method for laser marking
View Patent ↗When laser beams with a wavelength of 9.3 μm or 9.6 μm are used, a pulse width t (μsec) which is a radiation time of the laser beam and an energy density E (kw/cm 2 ) of the laser beam on an X-ray film are set such that they meet requirements based on an area A between line segments A 1 and A 2 . Moreover, when laser beams with a wavelength of a 10-micrometer band, such as 10.6 μm, is used, the pulse width and the energy density are set such that they meet requirements based on an area B between line segments B 1 and B 2 . As a result, since the pulse width t is within a range of equal to or larger than 3 μsec and smaller than 30 μsec, a high-quality marking pattern with excellent visibility can be formed while improving the productivity of the X-ray film.
1. A method for laser marking in which a predetermined array of dots for forming a marking pattern are formed by irradiating a photosensitive material with a laser beam oscillated through a laser oscillation device, wherein
when a wavelength λ of the laser beam is within a range of equal to or larger than 9 μm and smaller than 10 μm, and a pulse width t for driving the laser oscillation device in order to form one dot is within a range of equal to or larger than 3 μsec and smaller than 30 μsec,
an energy density E (kw/cm 2 ) of the laser beam on the photosensitive material and the pulse width t are set in an area defined by the following relations:
E=− 10 t+ 330, and
E=− 15 t+ 1000;
wherein said irradiating a photosensitive material deforms said photosensitive material to form dots having a convex surface; and
said dots comprise a plurality of small bubbles beneath the surface of the photosensitive material.
2. The method of claim 1 , wherein said dots have a maximum height of approximately 10 μm.
3. The method of claim 2 , wherein said bubbles have diameters between approximately 1 μm and 5 μm.
4. The method of claim 3 , wherein said dots have a diameter of approximately 200 μm.
5. A method for laser marking in which a predetermined array of dots for forming a marking pattern are formed by irradiating a photosensitive material with a laser beam oscillated through a laser oscillation device, wherein
when a wavelength λ of the laser beam is within a range of equal to or larger than 10 μm and smaller than 11 μm, and a pulse width t for driving the laser oscillation device in order to form one dot is within a range of equal to or larger than 3 μsec and smaller than 30 μsec,
an energy density E (kw/cm 2 ) of the laser beam on the photosensitive material and the pulse width t are set in an area defined by the following relations:
E=− 15 t+ 1000, and
E=− 25 t+ 1450;
wherein said irradiating a photosensitive material deforms said photosensitive material to form dots having a convex surface; and
said dots comprise a plurality of small bubbles beneath the surface of the photosensitive material.
6. The method according to one of claims 1 and 5 , wherein the laser beam is irradiated while the photosensitive material is being conveyed.
7. The method of claim 5 , wherein said dots have a maximum height of approximately 10 μm.
8. The method of claim 7 , wherein said bubbles have diameters between approximately 1 μm and 5 μm.
9. The method of claim 8 , wherein said dots have a diameter of approximately 200 μm.
10. A method for laser marking in which a predetermined array of dots for forming a marking pattern are formed by irradiating a photosensitive material with a laser beam oscillated through a laser oscillation device, wherein
when a wavelength λ of the laser beams is within a range of equal to or larger than 9 μm and smaller than 10 μm, and a pulse width t for driving the laser oscillation device in order to form one dot is within a range of equal to or larger than 30 μsec and smaller than 200 μsec,
an energy density E (kw/cm 2 ) of the laser beams on the photosensitive material and the pulse width t are set in an area defined by the following relations:
E=− 0.03 t+ 10, and
E=− 0.35 t+ 110;
wherein said irradiating a photosensitive material deforms said photosensitive material to form dots having a convex surface; and
said dots comprise a plurality of small bubbles beneath the surface of the photosensitive material.
11. The method of claim 10 , wherein said dots have a maximum height of approximately 10 μm.
12. The method of claim 11 , wherein said bubbles have diameters between approximately 1 μm and 5 μm.
13. The method of claim 12 , wherein said dots have a diameter of approximately 200 μm.