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App. No. 10/835,012 · Confirmation No. 8225

Photoresist compositions

Inventor: J. Neville Eilbeck
Abandoned -- Failure to Respond to an Office Action View Publication ↗
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 Code Description Pages PDF
2006-05-31 ABN Abandonment 2 View
2005-10-27 CTNF Non-Final Rejection 10 View
2005-10-27 1449 List of References cited by applicant and considered by examiner 1 View
2005-10-27 FWCLM Index of Claims 1 View
2005-10-27 SRFW Search information including classification, databases and other search related notes 1 View
2005-06-29 IDS Information Disclosure Statement (IDS) Form (SB08) 10 View
2005-06-29 FOR Foreign Reference 13 View
2005-06-20 A... Amendment/Request for Reconsideration-After Non-Final Rejection 2 View
2005-06-20 CLM Claims 10 View
2005-06-20 REM Applicant Arguments/Remarks Made in an Amendment 5 View
2005-06-20 XT/ Extension of Time 2 View
2005-06-20 WFEE Fee Worksheet (SB06) 1 View
2005-02-07 CTNF Non-Final Rejection 12 View
2005-02-07 1449 List of References cited by applicant and considered by examiner 8 View
2005-02-07 892 List of references cited by examiner 1 View
2005-02-07 FWCLM Index of Claims 1 View
2005-02-07 SRFW Search information including classification, databases and other search related notes 1 View
2005-02-07 BIB Bibliographic Data Sheet 1 View
2005-02-01 SRNT Examiner's search strategy and results 2 View
2004-12-20 IDS Information Disclosure Statement (IDS) Form (SB08) 7 View
2004-07-24 IDS Information Disclosure Statement (IDS) Form (SB08) 8 View
2004-04-29 TRNA Transmittal of New Application 9 View
2004-04-29 SPEC Specification 26 View
2004-04-29 CLM Claims 9 View
2004-04-29 ABST Abstract 1 View
2004-04-29 OATH Oath or Declaration filed 3 View
2004-04-29 WFEE Fee Worksheet (SB06) 1 View
2004-04-29 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
10/835,012
Filed
2004-04-29
Pub. No.
US20040197704A1
Art Unit
1752