Method for removing color resist for exposure alignment
View Patent ↗A method for removing color resist from an exposure alignment mark. In an embodiment, a color resist layer is formed over a color filter substrate with an alignment mark thereon. A concentric tube system is provided with an outer tube surrounding an inner tube. A solvent is injected via the inner tube to contact and dissolve the color resist directly overlying the alignment mark. The dissolved color resist is extracted by the outer tube of the concentric tube system to expose the alignment mark. By repeating the dissolving and extraction steps, all alignment marks on the color filter substrate are consequently uncovered for subsequent exposure alignment.
1. A method for removing color resist for exposure alignment, the method comprising:
providing a substrate with an alignment mark thereon;
forming a color resist layer over the substrate and the alignment mark;
injecting a solvent with an inner tube of a concentric tube system to contact the color resist over the alignment mark and dissolve the color resist, wherein the concentric tube system comprises an outer tube surrounding the inner tube; and
extraction of the dissolved color resist by the outer tube to expose the alignment mark.
2. The method as claimed in claim 1 , wherein the size of the substrate with the alignment mark exceeds 1000 mm×1000 mm.
3. The method as claimed in claim 1 , wherein the substrate is a glass substrate.
4. The method as claimed in claim 1 , wherein the color resist layer is formed by spin coating.
5. The method as claimed in claim 1 , wherein the color resist is red, blue, green, or black dye or pigment.
6. The method as claimed in claim 1 , wherein the solvent contacts the color resist by capillarity.
7. The method as claimed in claim 1 , wherein the cohesion of the solvent exceeds the adhesion thereof.
8. The method as claimed in claim 1 , the alignment mark is located in the center of the substrate.