IP Library Granted Patent US 6,918,241
Granted Patent B2
US 6,918,241 · App. 10/840,806 · Granted Jul 19, 2005

Cut resistant yarns and process for making the same, fabric and glove

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Quick Facts
Patent No.
US 6,918,241
App. No.
10/840,806
Granted
Jul 19, 2005
Kind
B2
Abstract

The present invention relates to a process of making a glove using resistant yarns employing the steps of knitting or weaving, heat setting coating and curing. The cut resistant yarn comprises a plurality of cut resistant filaments having a random entangle loop structure and at least one elastomeric filament.

Claims (9)

1. A process for making a glove comprising the steps of:

(a) kritting or weaving a glove from a cut resistant yarn having strength and recovery capabilities comprising at least one continuous synthetic elastomeric filament and a plurality of bulked continuous cut resistant filaments, wherein the plurality of bulked continuous cut resistant filaments have a random entangled loon structure in the yarn;

(b) heat setting the at least one elastomeric filament of the glove;

(c) coating the glove; and

(d) curing the coating disposed on the glove.

2. The glove of claim 1 wherein the at least one continuous synthetic elastomeric filament is selected from the group consisting of polyurethane filament, rubber and combinations thereof; and the plurality of bulked continuous cut resistant filaments is selected from the group consisting of aromatic polyimide, high molecular weight polyethylene, high molecular weight polyolefin, high molecular weight polyvinyl alcohol, high molecular weight polyacrylonitrile, liquid crystal polyester and combinations thereof.

3. The glove of claim 1 , wherein the yarn comprising the at least one continuous synthetic elastomeric filament and the continuous cut resistant filaments is in the range of about 70 to about 2800 denier.

4. The glove of claim 1 wherein the yarn is in the range of about 200 to about 800 denier.

5. The glove of claim 1 wherein the at least one continuous synthetic elastomeric filament is in the range of about 20 to about 200 denier.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 25, 2019
From: E. I. DU PONT DE NEMOURS AND COMPANY
To: DUPONT SAFETY & CONSTRUCTION, INC.
Reel/Frame 051180/0648 →