Semiconductor die attachment for high vacuum tubes
View Patent ↗There is described novel bonding and interconnecting techniques for use with semiconductor die for the creation of thermally efficient, physically compliant Ultra High Vacuum Tubes and the novel tube resulting therefrom.
1. An ultra high vacuum tube as an imaging device comprising a semiconductor die, a ceramic housing for the tube, said die having a plurality of electrical connections to said ceramic housing by pads in said ceramic housing and by pads in said die and by brazing materials between said pads, and an ultra high vacuum enclosed in said housing.
2. An ultra high vacuum tube in accordance with claim 1 including a photocathode within said vacuum within said housing.
3. An ultra high vacuum tube in accordance with claim 2 in which said semiconductor die comprises a charge coupled device and in which said charge coupled device is aligned with said photocathode for proximity imaging.
4. An ultra high vacuum tube as an imaging device comprising a semiconductor die comprising a CMOS device, a ceramic housing for the tube, said die having a plurality of electrical connections to said ceramic housing by pads in said ceramic housing and by pads in said die and by brazing materials between said pads, an ultra high vacuum enclosed in said housing, and a photocathode within said vacuum within said housing, said CMOS device being aligned within said vacuum with said photocathode for proximity imaging.
5. An ultra high vacuum tube as an imaging device comprising a semiconductor die comprising a back-thinned silicon imaging sensor bonded to a support substrate, a ceramic housing for the tube, said die having a plurality of electrical connections to said ceramic housing through pads in said ceramic housing and pads in said die and by brazing materials between said pads, and an ultra high vacuum enclosed in said housing, and a photocathode within said vacuum within said housing, in which said die is aligned with said photocathode within said vacuum for proximity imaging.
6. An ultra high vacuum tube in accordance with claim 4 in which said brazing material comprises indium.
7. An ultra high vacuum tube as an imaging device comprising a semiconductor die, a ceramic housing for the tube, said die having a plurality of electrical connections to said ceramic housing by pads in said ceramic housing and by pads in said die and by brazing materials between said pads; and an ultra high-vacuum enclosed in said housing, and a photocathode within said vacuum within said housing; said pads comprising SiO x N y , Chrome and Gold.
8. An ultra high vacuum tube as an imaging device comprising a semiconductor die, a ceramic housing for the tube, said die having a plurality of electrical connections to said ceramic housing by pads in said ceramic housing and by pads in said die and by brazing materials between said pads; and an ultra high vacuum enclosed in said housing; and a photocathode within said vacuum within said housing; said pads comprising SiO x N y , Titanium, Platinum and Gold.
9. An ultra high vacuum tube in accordance with claim 1 in which said brazing material comprises a low melting point metal or alloy of metal.
10. An ultra high vacuum tube in accordance with claim 6 in which said CMOS die comprises an APS device aligned to said photocathode within said tube in a manner to be electron bombarded during exposure of said photocathode in said tube.
11. An ultra high vacuum tube in accordance with claim 7 in which said brazing material comprises a low melting point metal or alloy of metal.
12. An ultra high vacuum tube in accordance with claim 2 in which said brazing material comprises a low melting point metal or alloy of metal.
13. An ultra high vacuum tube in accordance with claim 11 in which said brazing material comprises indium.
14. An ultra high vacuum tube as an imaging device comprising a semiconductor die, a housing of a different material for the tube, said die being electrically connected to said housing by pads in said housing and by pads in said die and by brazing materials between said pads, and an ultra high vacuum enclosed in said housing.
15. An ultra high vacuum tube as in claim 14 including a photocathode within said vacuum.
16. An ultra high vacuum tube in accordance with claim 14 in which there are at least three pad positions in said housing and at least three matching pad positions in said die.
17. An ultra high vacuum tube as an imaging device comprising a semiconductor die, a ceramic housing for the tube, said die having a plurality of electrical connections to said ceramic housing by pads in said ceramic housing and by pads in said die and by brazing materials between said pads, and an ultra high vacuum enclosed in said housing, and an MCP within said vacuum in alignment with said semiconductor die to create an image at the input of said semiconductor die corresponding to an input image to said MCP.
18. An ultra high vacuum tube as an imaging device comprising a semiconductor die, a housing of a different material for the tube, said die being electrically connected to said housing by pads in said housing and by pads in said die and by brazing materials between said pads, and an ultra high vacuum enclosed in said housing, the gap between said semiconductor die and said housing facing said die being no greater than about 1× the diameter of the braze pads used to join said semiconductor to said housing.
19. An ultra high vacuum tube as an imaging device comprising a semiconductor die, a ceramic housing for the tube, said die having a plurality of electrical connections to said ceramic housing by pads in said ceramic housing and by pads in said die and by brazing materials between said pads, and an ultra high vacuum enclosed in said housing, and a photocathode and an MCP within said vacuum all in alignment with said semiconductor die to create an image at the input of said semiconductor die corresponding to an input image to said MCP formed from an electron image generated by the photocathode.
20. An ultra high vacuum tube in accordance with claim 19 in which said semiconductor die comprises a backthinned CMOS supported on a substrate.
21. An ultra high vacuum tube in accordance with claim 19 in which said semiconductor die comprises a backthinned CCD supported on a substrate.
22. An ultra high vacuum tube in accordance with claim 19 in which said semiconductor die comprises an ROIC.
23. An ultra high vacuum tube as an imaging device comprising a semiconductor die, a ceramic housing for the tube, said die having a plurality of electrical connections to said ceramic housing by pads in said ceramic housing and by pads in said die and by brazing materials between said pads, and an ultra high vacuum enclosed in said housing, and in which said semiconductor die comprises a backthinned CMOS supported on a substrate.
24. An ultra high vacuum tube in accordance with claim 1 in which said semiconductor die comprises a backthinned CCD supported on a substrate.
25. An ultra high vacuum tube as an imaging device comprising a semiconductor die, a ceramic housing for the tube, said die having a plurality of electrical connections to said ceramic housing by pads in said ceramic housing and by pads in said die and by brazing materials between said pads, and an ultra high vacuum enclosed in said housing, said semiconductor die comprising an ROIC.