Image sensor and manufacturing method of image sensor
View Patent ↗In a manufacturing method of an image sensor, a lightproof film (an antireflective film for avoiding flares) is formed over a wiring area; a transparent film is formed over an imaging area using a material capable of patterning; a transparent film, for forming micro lense on top, is formed on the transparent film, wherein a height of the top surfaces of the transparent film and the lightproof film are evenly formed.
1. A manufacturing method of an image sensor the image sensor including an imaging area having a plurality of pixel units and a wiring area around the imaging area, the manufacturing method comprising:
a first step of forming a lightproof film over the wiring area and forming a transparent film over the imaging area by patterning; and
a second step of forming a flat film, an top of which micro lenses are formed, on the transparent film;
wherein in the first step, the lightproof film and the transparent film are formed such that a height between of a top surface of the transparent film and a height of a top surface of the lightproof film are substantially the same.
2. The manufacturing method according to claim 1 ,
wherein in the first step, the lightproof film is formed prior to forming the transparent film, and a thickness of each the lightproof film and a thickness of the transparent, film are determined such that the top surface of the lightproof film and the top surface of the transparent film are even with one another.
3. The manufacturing method according to claim 1 ,
wherein in the first step, the transparent film is formed by prior to forming the lightproof film, and a thickness of the lightproof film and a thickness of the transparent film are determined such that the top surface of the lightproof film and the top surface of the transparent film are even with one another.
4. The manufacturing method according to claim 1 ,
wherein in the first step, photoresists of different characteristics of sensitivity are used between a negative type and a positive type when the lightproof film and the transparent film are formed.
5. The manufacturing method according to claim 4 ,
wherein in the first step, the lightproof film is formed by prior to forming the transparent film, and a thickness of the lightproof film and a thickness of the transparent, film are determined such that the top surface of the lightproof film and the top surface of the transparent film are even with one another.
6. The manufacturing method according to claim 4 ,
wherein in the first step, the transparent film is formed prior to forming the lightproof film, and a thickness of each the lightproof film and a thickness of the transparent, film are determined such that the top surface of the lightproof film and the top surface of the transparent film are even with one another.
7. A manufacturing method of an image sensor, the image sensor including an imaging area having a plurality units and a wiring area around the imaging area, the manufacturing method comprising:
forming a flat film, on top of which micro lenses are formed, over the imaging area or over both the imaging area and the wiring area; and
forming a lightproof film over the wiring area,
wherein the lightproof film is formed under the flat film.