Optical metrology of single features
View Patent ↗The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.
1. A system for illuminating a single feature formed on a wafer; the system comprising:
a source with a focusing lens to focus a beam of light onto a portion of the single feature and scan the focused beam of light across the single feature, the focusing lens having a numerical aperture greater than the wavelength of the light used divided by twice the distance between the single feature and an adjacent feature;
a detector configured to detect beams of light diffracted from the single feature as the focused beam of light is scanned across the single feature; and
a processor connected to the detector configured to determine the profile of the single feature based on the beams of light detected by the detector.
2. The system of claim 1 , wherein the detector includes a focusing lens and a single photo-detector.
3. The system of claim 2 , wherein the detector includes a filter configured to generate a weight summation of the diffracted beams.
4. The system of claim 1 , wherein the detector includes a focusing lens and a detection array having a plurality of detection cells configured to receive diffracted beams at varying angles.
5. The system of claim 1 , wherein the source end detector use the same focusing lens, and further comprising:
a beam splitter disposed adjacent to the focusing lens, wherein the beam of light generated in the source is focused on the single feature through the beam splitter and the focusing lens, and the diffracted beams of light are detected in the detector through the focusing lens and the beam splitter.
6. The system of claim 5 , wherein the source includes a pupil stop configured to generate oblique incidence, and the detector includes a pupil stop.
7. The system of claim 6 , wherein the pupil stop of the source and the pupil stop of the detector are configured to synchronously shift from an initial incidence angle to a final incidence angle.
8. The system of claim 6 , wherein the pupil stops of the source and the detector have common shapes.
9. The system of claim 6 , wherein the pupil stops of the source and the detector having different shapes.
10. The system of claim 6 , wherein the detector includes a single photo-detector.
11. The system of claim 6 , wherein the detector includes a detection, array having a plurality of detection cells.
12. A system for illuminating a single feature formed on a wafer, the system comprising:
a source with a focusing lens to tens a beam of light onto a portion the single feature and scan the focused beam of light across the single feature, the focusing lens having a numerical aperture greater than the wavelength of the light used divided by twice the distance between the single feature and an adjacent feature;
a detector with a focusing lens to focus beams of light diffracted from the single feature as the focused beam of light is scanned across the single feature; and
a processor connected to the detector configured to determine the profile of the single feature based on the beams of light detected by the detector.
13. The system of claim 12 , wherein the detector includes a single photo-detector.
14. The system of claim 13 , wherein the detector includes a filter configured to generate a weight summation of the diffracted beams.
15. The system of claim 12 , wherein the detector includes a detection array having a plurality of detection cells configured to receive diffracted beams at varying angles.
16. A system for illuminating a single feature formed on a wafer, the system comprising:
a source configured to generate a beam of light to be focused onto a portion of the single feature and scan the focused beam of light across the single feature;
a detector configured to detect beams of light diffracted from the single feature as the focused beam of light is scanned across the single feature;
a single focusing tens shared by the source and the detector, the focusing lens having a numerical aperture greater than the wavelength of the light used divided by twice the distance between the single feature and an adjacent feature;
a beam splitter disposed adjacent to the single focusing lens, wherein the beam of light generated in the source is focused on the single feature through the beam splitter and the focusing lens, end the diffracted beams of light are detected in the detector through the focusing lens and the beam splitter; and
a processor connected to the detector configured to determine the profile of the single feature based on the beams of light detected by the detector.
17. The system of claim 16 , wherein the source includes a pupil stop configured to generate oblique incidence, and the detector includes a pupil stop.
18. The system of claim 17 , wherein the pupil stop of the source and the pupil stop of the detector are configured to synchronously shift from an initial incidence angle to a final incidence angle.
19. The system of claim 17 , wherein the pupil stops of the source and the detector have common shapes.
20. The system of claim 17 , wherein to pupil stops of the source and the detector having different shapes.
21. The system of claim 17 , wherein the detector includes a mingle photo-detector.
22. The system of claim 17 , wherein the detector includes a detection array having a plurality of detection cells.
23. A method of illuminating a single feature formed on a wafer, the method comprising:
generating a beam of light using a source;
focusing the generated beam of light onto a portion of time single feature using a focusing lens having a numerical aperture greater than the wavelength of the light used divided by twice the distance between the single feature and an adjacent feature;
scanning the focused beam of light across the single feature;
detecting beams of light diffracted from the single feature as the focused beam of light is scanned across the single feature using a detector; and
determining the profile of the single feature based on the beams of light detected by the detector using a processor connected to the detector.
24. The method of claim 23 , wherein scanning the focused beam of light comprises:
moving the wafer while focusing the generated beam of light onto a portion of to single feature.
25. The method of claim 23 , wherein scanning the focused beam of light comprises:
moving the source while focusing the generated beam of light onto a portion of the single feature.
26. The method of claim 23 , wherein the focused beam of light is scanned across the single feature using scanning minors.
27. The method of claim 23 , wherein beams of light diffracted from the single feature are detected at discrete intervals as the focused beam of light is scanned across the single feature.