IP Library Granted Patent US 7,235,682
Granted Patent B2
US 7,235,682 · App. 10/856,194 · Granted Jun 26, 2007

Process for manufacturing organochlorosilanes and dipodal silanes

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,235,682
App. No.
10/856,194
Granted
Jun 26, 2007
Kind
B2
Abstract

Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quarternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.

Claims (39)

1. A process for producing an organochlorosilane comprising:

mixing a hydridochlorosilane, an organic halide and a quaternary phosphonium salt catalyst,

providing sufficient heat to effect a dehydrohalogenative coupling reaction of the hydridochlorosilane with the organic halide, and

venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction.

2. The process according to claim 1 , wherein the process is continuous.

3. The process according to claim 2 , wherein the catalyst is in fluid form selected from the group consisting of a homogenous solution, a liquid and a molten catalyst.

4. The process according to claim 3 , wherein the catalyst comprises an alkyl phosphonium chloride.

5. The process according to claim 2 , wherein the reaction is carried out substantially isothermally.

6. The process according to claim 5 , wherein the reaction takes place in an isothermal plug flow reactor.

7. The process according to claim 5 , wherein the reaction takes place in an isothermal continuous stirred tank reactor.

8. The process according to claim 2 , wherein the reaction is carried out substantially isobarically.

9. The process according to claim 8 , wherein the reaction pressure does not exceed about 600 p.s.i.

10. The process according to claim 2 , wherein the residence time of the reaction in a reactor is not greater than about two hours.

11. A process for producing a dipodal silane comprising:

mixing a hydridochlorosilane, an alkene and a quaternary phosphonium salt catalyst,

providing sufficient heat to effect a double hydrosilylation reaction of the alkene with the hydridochlorosilane, and

venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction.

12. The process according to claim 11 , wherein the process is continuous.

13. The process according to claim 12 , wherein the catalyst is in fluid form selected from the group consisting of a homogenous solution, a liquid and a molten catalyst.

14. The process according to claim 13 , wherein the catalyst comprises an alkyl phosphonium chloride.

15. The process according to claim 12 , wherein the reaction is carried out substantially isothermally.

16. The process according to claim 15 , wherein the reaction takes place in an isothermal plug flow reactor.

17. The process according to claim 15 , wherein the reaction takes place in an isothermal continuous stirred tank reactor.

18. The process according to claim 12 , wherein the reaction is carried out substantially isobarically.

19. The process according to claim 18 , wherein the reaction pressure does not exceed about 600 p.s.i.

20. The process according to claim 12 , wherein the residence time of the reaction in a reactor is not greater than about five hours.

21. A process for producing a dipodal silane comprising:

mixing a hydridochlorosilane, a chloroalkene and a quaternary phosphonium salt catalyst,

providing sufficient heat to effect a dehydrohalogenative coupling reaction and a hydrosilylation reaction of the chloroalkene with the hydridochlorosilane, and

venting the reaction to control reaction pressure and to remove gaseous byproducts from the reactions.

22. The process according to claim 21 , wherein the process is continuous.

23. The process according to claim 22 , wherein the catalyst is in fluid form selected from the group consisting of a homogenous solution, a liquid and a molten catalyst.

24. The process according to claim 23 , wherein the catalyst comprises an alkyl phosphonium chloride.

25. The process according to claim 22 , wherein the reactions are carried out substantially isothermally.

26. The process according to claim 25 , wherein the reactions take place in an isothermal plug flow reactor.

27. The process according to claim 25 , wherein the reactions take place in an isothermal continuous stirred tank reactor.

28. The process according to claim 22 , wherein the reactions are carried out substantially isobarically.

29. The process according to claim 28 , wherein the pressure of the reactions does not exceed about 600 p.s.i.

30. The process according to claim 22 , wherein the residence time of the reactions in a reactor is not greater than about five hours.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Oct 1, 2020
From: ANTARES CAPITAL LP
To: GELEST BIOSYSTEMS, LLC; GELEST, INC.; GELEST TECHNOLOGIES, INC.
Reel/Frame 053946/0556 →
RELEASE OF SECURITY INTEREST Recorded Jun 24, 2019
From: WELLS FARGO BANK, NATIONAL ASSOCIATION
To: GELEST TECHNOLOGIES, INC.; GELEST, INC.; GELEST BIOSYSTEMS, LLC
Reel/Frame 049567/0194 →
PATENT SECURITY AGREEMENT Recorded Jun 21, 2019
From: GELEST, INC.; GELEST TECHNOLOGIES, INC.; GELEST BIOSYSTEMS, LLC
To: ANTARES CAPITAL LP
Reel/Frame 049557/0526 →
SECURITY INTEREST Recorded Aug 14, 2017
From: GELEST, INC.; GELEST TECHNOLOGIES, INC.; GELEST BIOSYSTEMS, LLC
To: WELLS FARGO BANK, NATIONAL ASSOCIATION
Reel/Frame 043540/0963 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 20, 2004
From: JANEIRO, BENIGNO A.; ARKLES, BARRY C.
To: GELEST INC.
Reel/Frame 015911/0099 →