The phantom for quality control used to perform verification of performance and invariance of a radiation imaging system includes substrates and image quality evaluation patterns fixed to the substrates. The patterns is photographed with the system and images obtained by photographing is evaluated based on image quality evaluation items. A coefficient of linear expansion α p of each of corresponding patterns fixed to each of the substrates and a coefficient of linear expansion α s of each of the substrates to which the corresponding patterns are fixed, are in a relation of |α p −α s |≦5×10 −5 .
1. A phantom for quality control used to perform verification of performance and invariance of a radiation imaging system, comprising:
substrates; and
image quality evaluation patterns fixed to said substrates, said image quality evaluation patterns being photographed with said radiation imaging system and pattern images obtained by photographing said image quality evaluation patterns being evaluated based on image quality evaluation items,
wherein a coefficient of linear expansion α p of each of corresponding image quality evaluation patterns which are fixed to each of said substrates and a coefficient of linear expansion α s of each of said substrates to which said corresponding image quality evaluation patterns are fixed, are in a relation of
|α p −α s |≦5.0×10 −5 , and
said corresponding image quality evaluation patterns are directly fixed to one corresponding substrate of said substrates.
2. The phantom for quality control according to claim 1 , wherein said coefficient of linear expansion α p of each of said corresponding image quality evaluation patterns and said coefficient of linear expansion α s of each of said substrates are in a relation of
|α p −α s |≦2.5×10 −5 .
3. The phantom for quality control according to claim 1 , wherein said coefficient of linear expansion a of each of said corresponding image quality evaluation patterns and said coefficient of linear expansion α s of each of said substrates are in a relation of
|α p −α s |≦1.5×10 −5 .
4. The phantom for quality control according to claim 1 , wherein said image quality evaluation patterns are fixed to said substrates by welding or bonding an image quality evaluation pattern on a substrate, alternatively, by molding integrally said image quality evaluation pattern with said substrate or forming said image quality evaluation pattern and said substrate through cuffing by an NC machine tool.
5. The phantom for quality control according to claim 1 , wherein said image quality evaluation patterns comprises:
first image quality evaluation patterns each made of a material or materials having a high radiation absorption rate; and
second image quality evaluation patterns each made of a material or materials having a low radiation absorption rate.
6. A phantom for quality control used to perform verification of performance and invariance of a radiation imaging system, comprising:
substrates, and
image quality evaluation patterns fixed to said substrates, said image quality evaluation patterns being photographed with said radiation imaging system and pattern images obtained by photographing said image quality evaluation patterns being evaluated based on image quality evaluation items,
wherein a coefficient of linear expansion α p of each of corresponding image quality evaluation patterns which are fixed to each of said substrates and a coefficient of linear expansion α s of each of said substrates to which said corresponding image quality evaluation patterns are fixed, are in a relation of:
|α p −α s |≦1.5×10 −5 ,
wherein said image quality evaluation patterns comprises:
first image quality evaluation patterns each made of a material or materials having a high radiation absorption rate; and
second image quality evaluation patterns each made of a material or materials having a low radiation absorption rate, and
wherein said first image quality evaluation patterns are made of a metal or metals and said second image quality evaluation patterns are made of a resin or resins.
7. The phantom for quality control according to claim 6 , further comprising:
a rectangular frame member having a hollow portion,
wherein said substrates includes:
a first rectangular substrate made of a metal and provided in said hollow portion of said rectangular frame member; and
a rectangular top plate made of a resin and placed in said hollow portion of said rectangular frame member to oppose said first rectangular substrate with a preset distance between said rectangular top plate and said first rectangular substrate, said rectangular top plate serving as a second substrate,
wherein, in a hollow space formed by said rectangular frame member, said first rectangular substrate and said rectangular top plate, said first image quality evaluation patterns are fixed to an upper surface of said first rectangular substrate and said second image quality evaluation patterns are fixed to a lower surface of said rectangular top plate.
8. The phantom for quality control according to claim 7 , wherein peripheral ends of said first rectangular substrate and said rectangular top plate are partially fixed to said rectangular frame member under a state where said peripheral ends are fitted into an inner peripheral portion of said rectangular frame member.
9. The phantom for quality control according to claim 8 , wherein said first rectangular substrate and said rectangular top plate are disposed on an inside in a thickness direction of said rectangular frame member.
10. The phantom for quality control according to claim 7 further comprising:
a supporting plate for supporting said first rectangular substrate,
wherein said supporting plate is made of a resin and placed in said hollow portion of said rectangular frame member to oppose said first rectangular substrate, and
wherein said first rectangular substrate is mounted on said supporting plate.
11. The phantom for quality control according to claim 6 , further comprising:
a box-shaped frame member having an opening portion,
wherein said substrates includes:
a first rectangular substrate made of a metal and provided in said opening portion of said box-shaped frame member; and
a second rectangular substrate made of a resin and provided in a center portion of said first rectangular substrate, and
wherein said first image quality evaluation patterns are fixed to an upper surface of said first rectangular substrate and said second image quality evaluation patterns are fixed to an upper surface of said second rectangular substrate.
12. The phantom for quality control according to claim 11 , wherein said first rectangular substrate is provided in a bottom portion of said box-shaped frame member.
13. The phantom for quality control according to claim 11 , further comprising:
a rectangular top plate made of a resin and fixed to said opening portion of said box-shaped frame member so that said opening portion is closed, said rectangular top plate serving as a protection plate.
14. The phantom for quality control according to claim 13 , wherein said first rectangular substrate and said rectangular top plate are disposed on an inside with a preset distance in a thickness direction of said box-shaped frame member.
15. A phantom for quality control used to perform verification of performance and invariance of a radiation imaging system, comprising:
substrates; and
image quality evaluation patterns fixed to said substrates, said image quality evaluation patterns being photographed with said radiation imaging system and pattern images obtained by photographing said image quality evaluation patterns being evaluated based on image quality evaluation items, wherein the image quality evaluation patterns are made of at least one of metal and resin.
16. The phantom of claim 15 wherein the image quality evaluation patterns comprise a first image quality evaluation pattern comprising metal and a second image quality evaluation pattern comprising resin.
17. A phantom for quality control used to perform verification of performance and invariance of a radiation imaging system, comprising:
substrates; and
image quality evaluation patterns fixed to said substrates, said image quality evaluation patterns being photographed with said radiation imaging system and pattern images obtained by photographing said image quality evaluation patterns being evaluated based on image quality evaluation items,
wherein a coefficient of linear expansion α p of each of corresponding image quality evaluation patterns which are fixed to each of said substrates and a coefficient of linear expansion α s of each of said substrates to which said corresponding image quality evaluation patterns are fixed, are in a relation of
|α p −α s |≦1.5×10 −5 .
18. The phantom for quality control according to claim 17 , wherein said image quality evaluation patterns are fixed to said substrates by welding or bonding an image quality evaluation pattern on a substrate, alternatively, by molding integrally said image quality evaluation pattern with said substrate or forming said image quality evaluation pattern and said substrate through cutting by an NC machine tool.
19. The phantom for quality control according to claim 17 , wherein said image quality evaluation patterns comprises:
first image quality evaluation patterns each made of a material or materials having a high radiation absorption rate; and
second image quality evaluation patterns each made of a material or materials having a low radiation absorption rate.