Positive-working resist composition
View Patent ↗A positive-working resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid, (B) a compound which generates an acid upon irradiation of an actinic ray or radiation, (C) a nonionic cyclic compound having at least one partial structure represented by the following formula (I) or (II) and at least having either a melting point of 35° C. or more or a boiling point of 100° C./10 mmHg or more: and (D) a solvent.
1. A positive-working resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid, (B) a compound which generates an acid upon irradiation of an actinic ray or radiation, (C) a nonionic cyclic compound having at least one partial structure represented by the following formula (I) or (II) and at least having either a melting point of 35° C. or more or a boiling point of 100° C./10 mmHg or more:
and (D) a solvent.
2. The positive-working resist composition as claimed in claim 1 , wherein the component (C) of the nonionic cyclic compound has an alicyclic structure or a bridged alicyclic structure, and at least one ring constituting the alicyclic structure or bridged alicyclic structure has at least one partial structure represented by the formula (I) or (II).
3. The positive-working resist composition as claimed in claim 2 , wherein the (C) component of the nonionic cyclic compound has a bridged alicyclic structure and does not have a benzene ring.
4. The positive-working resist composition as claimed in claim 1 , wherein the nonionic cyclic compound of the component (C) has two or more partial structures represented by the formula (I) and does not have a benzene ring.
5. The positive-working resist composition as claimed in claim 1 , wherein the nonionic cyclic compound of the component (C) has at least one partial structure represented by the above formula (II) and does not have a benzene ring.
6. The positive-working resist composition as claimed in claim 1 , which further comprises (E) a nitrogen-containing basic compound.
7. The positive-working resist composition as claimed in claim 1 , wherein atoms constituting the nonionic cyclic compound of the component (C) comprise only carbon atoms and hydrogen atoms except for the partial structure represented by the formula (I) or (II).
8. The positive-working resist composition as claimed in claim 1 , wherein the resin of the component (A) has an alicyclic structure or a bridged alicyclic structure.
9. The positive-working resist composition as claimed in claim 8 , wherein the resin of the component (A) is a resin having an alkali-soluble group protected with a 2-alkyl-2-adamantyl group or a 1-adamantyl-1-alkylalkyl group.
10. The positive-working resist composition as claimed in claim 8 , wherein the resin of the component (A) further has a repeating unit represented by the following formula (III):
wherein, R 1a represents a hydrogen atom, an alkyl group or a halogen atom, and R 2a represents a hydrogen atom or an alkyl group.
11. The positive-working resist composition as claimed in claim 8 , wherein the bridged alicyclic structure in the resin of the component (A) is dihydroxyadamantane.