IP Library Granted Patent US 7,071,529
Granted Patent B2
US 7,071,529 · App. 10/863,395 · Granted Jul 4, 2006

Semiconductor device having a Damascene gate or a replacing gate

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Quick Facts
Patent No.
US 7,071,529
App. No.
10/863,395
Granted
Jul 4, 2006
Kind
B2
Abstract

A semiconductor device includes semiconductor elements and at least one dummy pattern. Each or at least some of the semiconductor elements has a Damascene gate structure or a replacing gate structure and is located in element-forming regions. In addition, at least a dummy pattern is located in a region different from the element-forming regions. The dummy pattern may have a semiconductor element structure of the same or different kind from the Damascene gate structure or replacing gate structure. The dummy pattern may be a pattern of an insulating film, an interface transistor, or an analog circuit capacitor electrode instead of the dummy gate.

Claims (4)

1. A semiconductor device comprising:

a plurality of semiconductor elements located in element-forming regions of a semiconductor substrate, said semiconductor elements having a Damascene gate structure or a replacing gate structure; and

a dummy pattern located in a region other than said element-forming regions, said dummy pattern having a gate structure made of materials different from the materials of said Damascene gate structure and said replacing gate structure.

2. The semiconductor device according to claim 1 , wherein said dummy pattern includes an insulating film.

Assignments (1)
RELEASE OF SECURITY INTEREST Recorded Jul 12, 2022
From: VENTURE LENDING & LEASING IX, INC.; WTI FUND X, INC.
To: PARALLEL WIRELESS, INC.
Reel/Frame 060900/0022 →