Positive photosensitive composition

1. A positive photosensitive composition comprising:

(A) a compound capable of generating a sulfonic acid represented by formula (X) below upon irradiation with one of an actinic ray and radiation; and

(B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer:

wherein the R 1a to R 13a groups each represents a hydrogen atom, an alkyl group, a haloalkyl group, a halogen atom or a hydroxyl group; A 1 and A 2 , which are the same or different, each represents a hetero atom-containing divalent linkage group; m 1 to m 5 , which are the same or different, each represents an integer of 0 to 12; and p represents an integer of 0 to 4; and

wherein the number of fluorine atoms in the sulfonic acid represented by formula (X) is smaller than the number of hydrogen atoms in the sulfonic acid represented by formula (X).

2. The positive photosensitive composition as claimed in claim 1 , wherein A 1 and A 2 in the formula (X) each independently represents a linkage group selected from the group consisting of —O—, —S—, —CO—, —COO—, —CONR—, —SO 2 NR—, —CONRCO—, —SO 2 NRCO—, —SO 2 NRSO 2 — and —OCONR—, wherein R represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, which may be substituted with a halogen atom, a hydroxyl group or an alkoxy group, and R may combine with at least one of the R 1a to R 13a groups to form a ring.

3. A sulfonium salt compound or an iodonium salt compound capable of generating a sulfonic acid represented by formula (X) below upon irradiation with one of an actinic ray and radiation:

wherein the R 1a to R 13a groups each represents a hydrogen atom, an alkyl group, a haloalkyl group, a halogen atom or a hydroxyl group, provided that R 12a and/or R 13a represent a fluorine atom; A 1 and A 2 , which are the same or different, each represents a single bond or a hetero atom-containing divalent linkage group, provided that, when each of A 1 and A 2 is single bond, all of the R 1a to R 13a groups do not simultaneously represent a fluorine atom and all of the R 1a to R 13a groups do not simultaneously represent a hydrogen atom; m 1 to m 5 , which are the same or different, each represents an integer of 0 to 12; and p represents an integer of 0 to 4; and

wherein the number of fluorine atoms in the sulfonic acid represented by formula (X) is smaller than the number of hydrogen atoms in the sulfonic acid represented by formula (X).

4. A positive photosensitive composition comprising:

(A) a compound capable of generating a sulfonic acid represented by formula (X) below upon irradiation with one of an actinic ray and radiation; and

(B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer:

wherein the R 1a to R 13a groups each represents a hydrogen atom, an alkyl group, a haloalkyl group, or a hydroxyl group; A 1 and A 2 , which are the same or different, each represents a hetero atom-containing divalent linkage group; m 1 to m 5 , which are the same or different, each represents an integer of 0 to 12; and p represents an integer of 0 to 4; and

wherein the compound (A) is an ester compound of the sulfonic acid represented by formula (X).

5. The positive photosensitive composition as claimed in claim 4 , wherein A1 and A2 in the formula (X) each independently represents a linikage group selected from the group consisting of —O—, —S—, —CO—, —COO—, —CONR—, —SO2NR—, —CONRCO—, —SO2NRCO—, —SO2NRSO2— and —OCONR—, wherein R represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, which may be substituted with a halogen atom, a hydroxyl group or an alkoxy group, and R may combine with at least one of the R1a to R13a groups to form a ring.

6. The positive photosensitive composition as claimed in claim 4 , wherein the ester compound is selected from the group consisting of an o-nitrobenzylsulfonate compound, an N-sulfonyloxyimido compound and an oximesulfonate compound.

7. A compound capable of generating a sulfonic acid represented by formula (X) below upon irradiation with one of an actinic ray and radiation:

wherein the R 1a to R 13a groups each represents a hydrogen atom, an alkyl group, a haloalkyl group, a halogen atom or a hydroxyl group; A 1 and A 2 , which are the same or different, each represents a hetero atom-containing divalent linkage group, m 1 to m 5 , which are the same or different, each represents an integer of 0 to 12; and p represents an integer of 0 to 4; and

wherein the compound is an ester compound of the sulfonic acid represented by the formula (X).

8. The compound as claimed in claim 7 , wherein A 1 and A 2 in the formula (X) each independently represents a linkage group selected from the group consisting of —O—, —S—, —CO—, —COO—, —CONR—, —SO 2 NR—, —CONRCO—, —SO 2 NRCO—, —SO 2 NRSO 2 — and —OCONR—, wherein R represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, which may be substituted with a halogen atom, a hydroxyl group or an alkoxy group, and R may combine with at least one of the R 1a to R 13a groups to form a ring.

9. The compound as claimed in claim 7 , wherein the ester compound is selected from the group consisting of an o-nitrobenzylsulfonate compound, an N-sulfonyloxyimido compound and an oximesulfonate compound.