IP Library Granted Patent US 7,157,210
Granted Patent B2
US 7,157,210 · App. 10/866,800 · Granted Jan 2, 2007

Plate-making method, plate-making apparatus used in such plate-making method, and image recording material

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,157,210
App. No.
10/866,800
Granted
Jan 2, 2007
Kind
B2
Abstract

A plate-making method is capable of recording a sharp image on a photosensitive plate, and is applicable to a process operation executed in a light room, while adverse influences caused by laser flares can be hardly received. Ultra-short pulse laser light emitted from a Ti:Al 2 O 3 laser light source is modulated by an AOM (acousto-optic modulating element). The modulated laser light is focused by a collective lens onto a high-sensitive photopolymer layer of a photosensitive plate-making material. The focused ultra-short pulse laser light may cause a photopolymerization reaction in a laser-light-irradiated portion of the high-sensitive photopolymer layer by way of a multiple photon absorption phenomenon, so as to form a hardened portion.

Claims (15)

1. A plate-making method comprising the steps of:

preparing a photosensitive plate-making material;

scanning said photosensitive plate-making material by using modulated laser light so as to record an image on said photosensitive plate-making material, said laser light including ultra-short pulse laser light which causes photopolymerization reaction by a multiple photon absorption phenomenon at a laser-light-irradiated portion of said photosensitive plate-making material; and

developing said image recorded on said photosensitive plate-making material.

2. A plate-making method according to claim 1 wherein:

a pulse width of said ultra-short pulse laser light is not longer than 10 ps.

3. A plate-making method according to claim 1 wherein:

a wavelength of said ultra-short pulse laser light is not longer than 800 nm; and

a photosensitive wavelength of said photosensitive plate-making material is not longer than 400 nm.

4. A plate-making method according to claim 1 wherein:

said photosensitive plate-making material includes a photosensitive layer made of photopolymer on a supporting member, said photopolymer including a compound that changes from monomer to polymer by being irradiated with the laser light.

5. A plate-making method according to claim 2 wherein:

said photosensitive plate-making material includes a photosensitive layer made of photopolymer on a supporting member, said photopolymer including a compound that changes from monomer to polymer by being irradiated with the laser light.

6. A plate-making method according to claim 3 wherein:

said photosensitive plate-making material includes a photosensitive layer made of photopolymer on a supporting member, said photopolymer including a compound that changes from monomer to polymer by being irradiated with the laser light.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →