Manufacturing method of embossing pattern and reflective liquid crystal display device including the same
View Patent ↗A method of forming embossing patterns includes forming a metal layer over a substrate, irradiating a laser beam on the metal layer by using a laser apparatus including an optical scanner, and patterning the metal layer by controlling a scan speed of the optical scanner, thereby forming embossing patterns. The inventive embossing patterns can be formed without using a photoresist patterning step.
1. A method of forming embossing patterns, comprising:
forming a metal layer over a substrate;
irradiating a laser beam at the metal layer by using a laser apparatus including an optical scanner; and
patterning the metal layer by controlling a scan speed of the optical scanner, thereby forming embossing patterns.
2. The method according to claim 1 , wherein the optical scanner is a galvo system scanner comprising a mirror, a lens and a driving axis.
3. The method according to claim 2 , wherein the embossing patterns are formed by varying a depth of focus by moving the driving axis.
4. The method according to claim 3 , wherein the driving axis is moved up, down, left and right.
5. The method according to claim 1 , wherein the laser beam has a wavelength within a range of 0.266 μm to 10.6 μm.
6. The method according to claim 1 , wherein the embossing patterns have a uniform thickness.
7. The method according to claim 1 , wherein the embossing patterns have one body.
8. The method according to claim 1 , wherein the substrate is arranged parallel to the optical scanner.
9. The method according to claim 6 , wherein each embossing pattern is substantially completely symmetrical.
10. The method according to claim 1 , wherein the substrate is arranged to have an inclined angle with respect to the optical scanner.
11. The method according to claim 10 , wherein each embossing pattern is asymmetrical.
12. The method according to claim 1 , wherein the embossing patterns are formed by a depth of focus of the laser beam.
13. The method according to claim 1 , wherein the embossing patterns are formed without using a photoresist.
14. A liquid crystal display device, comprising:
a first substrate and a second substrate spaced apart from and facing into each other;
a pixel electrode over an inner surface of the first substrate, a top surface of the pixel electrode having metal embossing patterns, a bottom surface of the pixel electrode being flat;
a common electrode on an inner surface of the second substrate; and
a liquid crystal layer interposed between the first and second substrates.
15. The device according to claim 14 , wherein the pixel electrode reflects light and the liquid crystal display device is a reflective type.
16. The device according to claim 14 , wherein the pixel electrode includes a reflector of the embossing patterns and the liquid crystal device is a transflective type having both a reflective mode and a transmissive mode.
17. The device according to claim 14 , further comprising a thin film transistor connected to the pixel electrode.