IP Library Granted Patent US 7,361,946
Granted Patent B2
US 7,361,946 · App. 10/879,704 · Granted Apr 22, 2008

Semiconductor device-based sensors

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Quick Facts
Patent No.
US 7,361,946
App. No.
10/879,704
Granted
Apr 22, 2008
Kind
B2
Abstract

Semiconductor device-based chemical sensors and methods associated with the same are provided. The sensors include regions that can interact with chemical species being detected. The chemical species may, for example, be a component of a fluid (e.g., gas or liquid). The interaction between the chemical species and a region of the sensor causes a change in a measurable property (e.g., an electrical property) of the device. These changes may be related to the concentration of the chemical species in the medium being characterized.

Claims (20)

1. A FET-based chemical sensor designed to detect a chemical species comprising:

a semiconductor material region comprising a gallium nitride material layer;

a source electrode formed on the semiconductor material region;

a drain electrode formed on the semiconductor material region;

a gate electrode formed on the semiconductor material region; and

a sensing region comprising the gallium nitride material layer and a sensing electrode, laterally separated from the gate electrode, and capable of interacting with the chemical species to change a measurable property of the chemical sensor.

2. The sensor of claim 1 , wherein the sensing region comprises a surface region of the gallium nitride material layer positioned under the sensing electrode.

3. The sensor of claim 1 , wherein the sensing region is formed between the source electrode and the drain electrode.

4. The sensor of claim 1 , wherein a ratio of sensing electrode surface area to total channel surface area is greater than 0.35.

5. The sensor of claim 1 , wherein a separate voltage may be applied to each of the source, drain, gate and sensing electrodes.

6. The sensor of claim 1 , further comprising a substrate.

7. The sensor of claim 6 , wherein the substrate is a silicon substrate.

8. The sensor of claim 6 , further comprising a compositionally-graded transition layer formed between the substrate and the semiconductor material region.

9. The sensor of claim 1 , wherein the chemical species is a gaseous species.

10. The sensor of claim 1 , wherein the interaction between the chemical species and the sensing region results in a change in the drain current of the sensor.

11. The sensor of claim 1 , wherein the interaction between the chemical species and the sensing region changes the surface potential of the gallium nitride material layer.

12. The sensor of claim 1 , wherein the chemical species is adsorbed by the sensing region during operation.

13. The sensor of claim 1 , wherein the sensing region is positioned between the gate electrode and the drain electrode.

14. The sensor of claim 1 , wherein the source, gate and drain electrodes are formed on the gallium nitride material layer.

15. The sensor of claim 1 , wherein the gate electrode is isolated from the chemical species.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 4, 2019
From: INFINEON TECHNOLOGIES AMERICAS CORP.
To: MACOM TECHNOLOGY SOLUTIONS HOLDINGS, INC.
Reel/Frame 047908/0097 →
CHANGE OF NAME Recorded Jul 23, 2018
From: INTERNATIONAL RECTIFIER CORPORATION
To: INFINEON TECHNOLOGIES AMERICAS CORP.
Reel/Frame 046612/0968 →
CONFIDENTIAL EXCLUSIVE LICENSE AND IP PURCHASE AGREEMENTS THAT RESTRICT PATENT ASSIGNMENT BY CURRENT OWNER (ONLY NON-CONFIDENTIAL, PUBLIC MATERIALS SUMMARIZING AGREEMENTS AND LITIGATION DISPUTES RELATING TO THE SAME ATTACHED) Recorded Nov 3, 2017
From: INTERNATIONAL RECTIFIER CORPORATION
To: NITRONEX LLC; MACOM TECHNOLOGY SOLUTIONS HOLDINGS, INC.
Reel/Frame 044532/0627 →